Sapphire surface patterning using femtosecond laser micromachining

Cho Wei Chang, Chien Yu Chen, Tien Li Chang*, Chia Jen Ting, Chien Ping Wang, Chang Pin Chou

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

28 Citations (Scopus)


This study presents an alternative method for micron-resolution patterning of a sapphire surface utilizing the characteristic of an ultra-short pulse (10-15 s) from ytterbium (Yb) femtosecond laser (FS-laser) irradiation. Conventional processes often involve several steps, such as wet chemical or dry etching, for surface structuring of sapphire. In this study, two-dimensional array patterns on the sapphire surface with an area of 5 × 5 mm2 and a depth of 1.2 ± 0.1 μm can be directly and easily fabricated by a single step of the FS-laser process, which involves 350-fs laser pulses with a wavelength of 517 nm at a repetition rate of 100 kHz. The measured ablation depths on the sapphire surface display that the proposed process can be under wellcontrolled conditions. Based on the design changes for being quickly implemented in the micromachining process, a FS laser can be a promising and competitive tool for patterning sapphire with an acceptable quality for industrial usage.

Original languageEnglish
Pages (from-to)441-448
Number of pages8
JournalApplied Physics A: Materials Science and Processing
Issue number2
Publication statusPublished - 2012 Nov

ASJC Scopus subject areas

  • General Chemistry
  • General Materials Science


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