Remote inductive effects in the Si 2p spectra of halogenated silicon

W. C. Simpson; J. A. Yarmoff; W. H. Hung; F. R. McFeely

doi:10.1016/0039-6028(96)00517-1

Remote inductive effects in the Si 2p spectra of halogenated silicon

W. C. Simpson, J. A. Yarmoff^*, W. H. Hung, F. R. McFeely

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

Si 2p spectra collected from fluorinated Si(111)-7 × 7 are analyzed to determine whether chemical shifts induced by remote F atoms are discernible. Although the traditional interpretation adequately accounts for the observed chemical shifts without considering remotely induced shifts, recent experimental evidence indicates that such shifts may occur for highly electronegative adsorbates. Thus, an extended scheme is outlined that is consistent with all known data, but which includes remotely induced shifts. It is found that, although they differ quantitatively, both approaches yield the same qualitative results for fluorinated Si.

Original language	English
Pages (from-to)	L283-L288
Journal	Surface Science
Volume	355
Issue number	1-3
DOIs	https://doi.org/10.1016/0039-6028(96)00517-1
Publication status	Published - 1996 Jun 1
Externally published	Yes

Keywords

Halogens
Low index single crystal surfaces
Photoelectron emission
Silicon
Soft X-ray photoelectron spectroscopy

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

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10.1016/0039-6028(96)00517-1

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@article{ffb6fdad75ae41db81fae53129b21591,

title = "Remote inductive effects in the Si 2p spectra of halogenated silicon",

abstract = "Si 2p spectra collected from fluorinated Si(111)-7 × 7 are analyzed to determine whether chemical shifts induced by remote F atoms are discernible. Although the traditional interpretation adequately accounts for the observed chemical shifts without considering remotely induced shifts, recent experimental evidence indicates that such shifts may occur for highly electronegative adsorbates. Thus, an extended scheme is outlined that is consistent with all known data, but which includes remotely induced shifts. It is found that, although they differ quantitatively, both approaches yield the same qualitative results for fluorinated Si.",

keywords = "Halogens, Low index single crystal surfaces, Photoelectron emission, Silicon, Soft X-ray photoelectron spectroscopy",

author = "Simpson, {W. C.} and Yarmoff, {J. A.} and Hung, {W. H.} and McFeely, {F. R.}",

note = "Funding Information: This work was supportedb y the Director, office of Energy Researcho, fficeof Basic Energy SciencesM, aterialsS ciencesD ivision of the US Departmento f Energy under Contract No. DE-AC03-76SF00098D.a ta were collecteda t the National SynchrotronLi ght Source,B rookhaven National Laboratoryw, hich is supportedb y the Departmento f Energy (Division of Materials Sciencesa ndDivision of ChemicaSl ciencesB, asic Energy Sciencesu) nderC ontractN o. DE-AC02-76CH0001 6.",

year = "1996",

month = jun,

day = "1",

doi = "10.1016/0039-6028(96)00517-1",

language = "English",

volume = "355",

pages = "L283--L288",

journal = "Surface Science",

issn = "0039-6028",

publisher = "Elsevier BV",

number = "1-3",

}

TY - JOUR

T1 - Remote inductive effects in the Si 2p spectra of halogenated silicon

AU - Simpson, W. C.

AU - Yarmoff, J. A.

AU - Hung, W. H.

AU - McFeely, F. R.

N1 - Funding Information: This work was supportedb y the Director, office of Energy Researcho, fficeof Basic Energy SciencesM, aterialsS ciencesD ivision of the US Departmento f Energy under Contract No. DE-AC03-76SF00098D.a ta were collecteda t the National SynchrotronLi ght Source,B rookhaven National Laboratoryw, hich is supportedb y the Departmento f Energy (Division of Materials Sciencesa ndDivision of ChemicaSl ciencesB, asic Energy Sciencesu) nderC ontractN o. DE-AC02-76CH0001 6.

PY - 1996/6/1

Y1 - 1996/6/1

N2 - Si 2p spectra collected from fluorinated Si(111)-7 × 7 are analyzed to determine whether chemical shifts induced by remote F atoms are discernible. Although the traditional interpretation adequately accounts for the observed chemical shifts without considering remotely induced shifts, recent experimental evidence indicates that such shifts may occur for highly electronegative adsorbates. Thus, an extended scheme is outlined that is consistent with all known data, but which includes remotely induced shifts. It is found that, although they differ quantitatively, both approaches yield the same qualitative results for fluorinated Si.

AB - Si 2p spectra collected from fluorinated Si(111)-7 × 7 are analyzed to determine whether chemical shifts induced by remote F atoms are discernible. Although the traditional interpretation adequately accounts for the observed chemical shifts without considering remotely induced shifts, recent experimental evidence indicates that such shifts may occur for highly electronegative adsorbates. Thus, an extended scheme is outlined that is consistent with all known data, but which includes remotely induced shifts. It is found that, although they differ quantitatively, both approaches yield the same qualitative results for fluorinated Si.

KW - Halogens

KW - Low index single crystal surfaces

KW - Photoelectron emission

KW - Silicon

KW - Soft X-ray photoelectron spectroscopy

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UR - http://www.scopus.com/inward/citedby.url?scp=0030166316&partnerID=8YFLogxK

U2 - 10.1016/0039-6028(96)00517-1

DO - 10.1016/0039-6028(96)00517-1

M3 - Article

AN - SCOPUS:0030166316

SN - 0039-6028

VL - 355

SP - L283-L288

JO - Surface Science

JF - Surface Science

IS - 1-3

ER -

Remote inductive effects in the Si 2p spectra of halogenated silicon

Abstract

Keywords

ASJC Scopus subject areas

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