Random polarization distribution of multi-domain model for polycrystalline ferroelectric HfZrO2

  • K. T. Chen
  • , C. Y. Liao
  • , K. Y. Hsiang
  • , S. H. Chang
  • , F. J. Hsieh
  • , H. Liang
  • , S. H. Chiang
  • , J. H. Liu
  • , K. S. Li
  • , S. T. Chang
  • , M. H. Lee*
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

Device dimension scaling down to be comparable to the domain size of polycrystalline ferroelectric HfZrO2 (HZO) is evaluated for subthreshold swing (SS) and drain-induced barrier lowering (DIBL) by numerical simulation. The proposed multi-domain modeling involves polarization random location in HZO and probability with Gaussian distribution, as well as being integrated with the Landau-Khalatnikov equation. A small device with a few domains exhibits steep SS compared with large dimension with many domains. The N-DIBL (negative-DIBL) is also estimated by using this model, and the negative capacitance effect retards the short-channel effects significantly. The trend of the experimental data and simulation results of fin field-effect transistors and planar field-effect transistors is consistent with nano-scale and micro-scale devices, respectively.

Original languageEnglish
Article number125011
JournalSemiconductor Science and Technology
Volume35
Issue number12
DOIs
Publication statusPublished - 2020 Oct

Keywords

  • HfZrO
  • ferroelectric
  • multi-domain

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

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