Proximity effect of electron beam lithography on single-electron transistors

Shu-Fen Hu, Kuo Dong Huang, Yue Min Wan, Chin Lung Sung

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

A simple method, based on the proximity effect of electron beam lithography, alleviated by exposing various shapes in the pattern of incident electron exposures with various intensities, was applied to fabricate silicon point-contact devices. The drain current (Id) of the device oscillates against gate voltage. The electrical characteristics of the single-electron transistor were observed to be consistent with the expected behavior of electron transport through gated quantum dots, up to 150 K. The dependence of the electrical characteristics on the dot size reveals that the Id oscillation follows from the Coulomb blockade by poly-Si grains in the poly-Si dot. The method of fabrication of this device is completely compatible with complementary metal-oxide-semiconductor technology, raising the possibility of manufacturing large-scale integrated nanoelectronic systems.

Original languageEnglish
Pages (from-to)57-65
Number of pages9
JournalPramana - Journal of Physics
Volume67
Issue number1
DOIs
Publication statusPublished - 2006 Jan 1

Fingerprint

single electron transistors
lithography
electron beams
CMOS
electrons
manufacturing
quantum dots
oscillations
fabrication
electric potential
silicon

Keywords

  • Nanostructures
  • Semiconductors
  • Transport

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Proximity effect of electron beam lithography on single-electron transistors. / Hu, Shu-Fen; Huang, Kuo Dong; Wan, Yue Min; Sung, Chin Lung.

In: Pramana - Journal of Physics, Vol. 67, No. 1, 01.01.2006, p. 57-65.

Research output: Contribution to journalArticle

Hu, Shu-Fen ; Huang, Kuo Dong ; Wan, Yue Min ; Sung, Chin Lung. / Proximity effect of electron beam lithography on single-electron transistors. In: Pramana - Journal of Physics. 2006 ; Vol. 67, No. 1. pp. 57-65.
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