Properties of TiO₂ films deposited on flexible substrates using direct current magnetron sputtering and using high power impulse magnetron sputtering

Physics & Astronomy

• impulses 68%
• magnetron sputtering 62%
• direct current 58%
• polyethylene terephthalate 28%
• anatase 27%
• rutile 26%
• Taguchi methods 19%
• analysis of variance 17%
• methylene blue 16%
• irradiation 16%
• rooms 11%
• aqueous solutions 11%
• signal to noise ratios 10%
• sputtering 9%
• argon 9%
• coatings 8%
• ceramics 8%
• temperature 7%
• diffraction 6%
• thin films 6%
• gases 6%
• performance 5%

Engineering & Materials Science

• Magnetron sputtering 100%
• Substrates 52%
• Titanium dioxide 32%
• Polyethylene terephthalates 32%
• Irradiation 25%
• Photocatalytic activity 21%
• Hydrophilicity 18%
• Sputtering 16%
• Taguchi methods 14%
• Argon 14%
• Contact angle 13%
• Diffraction 13%
• Crystalline materials 13%
• Analysis of variance (ANOVA) 12%
• Thin films 11%
• Signal to noise ratio 10%
• Temperature 10%
• Coatings 9%
• Gases 7%
• Experiments 4%

Chemical Compounds

• Magnetron Sputtering 86%
• Liquid Film 36%
• Rutile 29%
• Ultraviolet Irradiation 27%
• Titanium Dioxide 24%
• Sputtering 16%
• Hydrophilicity 13%
• Methylene Blue 13%
• Photocatalytic Activity 11%
• Ceramic 11%
• Coating Agent 8%
• Pressure 8%
• Environment 8%
• Gas 7%
• Aqueous Solution 7%
• Crystal Structure 7%
• Mixture 6%