Properties of TiO2 films deposited on flexible substrates using direct current magnetron sputtering and using high power impulse magnetron sputtering

M. J. Twu, A. H. Chiou, C. C. Hu, C. Y. Hsu*, C. G. Kuo

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

31 Citations (Scopus)

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