Properties of TiO2 films deposited on flexible substrates using direct current magnetron sputtering and using high power impulse magnetron sputtering

M. J. Twu, A. H. Chiou, C. C. Hu, C. Y. Hsu, C. G. Kuo

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17 Citations (Scopus)

Abstract

Abstract Mixture phases of anatase and rutile, TiO2 thin films are deposited on flexible polyethylene terephthalate (PET) substrates by direct current magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS), using a ceramic TiO2 target in an argon gas environment, at temperatures ranging from room to 150 C. The Taguchi method for the design of a robust experiment, with an orthogonal array, a signal-to-noise ratio and an analysis of variance are used to analyze the performance characteristics of the deposition parameters. This study determines the effect of the deposition parameters, such as the dc power (W), the sputtering pressure (Pa) and the substrate temperature (C) on the structural and photocatalytic characteristics of the TiO2 films. For both dcMS- and HiPIMS-grown films, the (110), (200) and (210) peaks of the rutile structure and the (200) peak of the anatase structure are observed. Compared to the coatings onto PET substrates using dcMS, the samples deposited using HiPIMS exhibited excellent photoinduced hydrophilicity and high photocatalytic activity. The contact angles are decreased to less than 4.1 after UV irradiation for 9 min, and the absorbance of the methylene blue aqueous solution is reduced to 0.3 for 240 min UV irradiation. Furthermore, the XRD diffraction peaks of the TiO2 films using HiPIMS become sharper and more intense, which demonstrates that the crystalline structure of the TiO2 films is improved. Higher visible-light photocatalytic efficiency was achieved with HiPIMS technique.

Original languageEnglish
Article number7600
Pages (from-to)1-7
Number of pages7
JournalPolymer Degradation and Stability
Volume117
DOIs
Publication statusPublished - 2015 Jul 1

Fingerprint

Magnetron sputtering
impulses
magnetron sputtering
direct current
Substrates
Polyethylene Terephthalates
polyethylene terephthalate
anatase
rutile
Polyethylene terephthalates
Titanium dioxide
Irradiation
Taguchi methods
analysis of variance
irradiation
Argon
Methylene Blue
methylene blue
Hydrophilicity
Analysis of variance (ANOVA)

Keywords

  • Flexible substrates
  • HiPIMS
  • Taguchi method
  • TiO films
  • dcMS

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Mechanics of Materials
  • Polymers and Plastics
  • Materials Chemistry

Cite this

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title = "Properties of TiO2 films deposited on flexible substrates using direct current magnetron sputtering and using high power impulse magnetron sputtering",
abstract = "Abstract Mixture phases of anatase and rutile, TiO2 thin films are deposited on flexible polyethylene terephthalate (PET) substrates by direct current magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS), using a ceramic TiO2 target in an argon gas environment, at temperatures ranging from room to 150 C. The Taguchi method for the design of a robust experiment, with an orthogonal array, a signal-to-noise ratio and an analysis of variance are used to analyze the performance characteristics of the deposition parameters. This study determines the effect of the deposition parameters, such as the dc power (W), the sputtering pressure (Pa) and the substrate temperature (C) on the structural and photocatalytic characteristics of the TiO2 films. For both dcMS- and HiPIMS-grown films, the (110), (200) and (210) peaks of the rutile structure and the (200) peak of the anatase structure are observed. Compared to the coatings onto PET substrates using dcMS, the samples deposited using HiPIMS exhibited excellent photoinduced hydrophilicity and high photocatalytic activity. The contact angles are decreased to less than 4.1 after UV irradiation for 9 min, and the absorbance of the methylene blue aqueous solution is reduced to 0.3 for 240 min UV irradiation. Furthermore, the XRD diffraction peaks of the TiO2 films using HiPIMS become sharper and more intense, which demonstrates that the crystalline structure of the TiO2 films is improved. Higher visible-light photocatalytic efficiency was achieved with HiPIMS technique.",
keywords = "Flexible substrates, HiPIMS, Taguchi method, TiO films, dcMS",
author = "Twu, {M. J.} and Chiou, {A. H.} and Hu, {C. C.} and Hsu, {C. Y.} and Kuo, {C. G.}",
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T1 - Properties of TiO2 films deposited on flexible substrates using direct current magnetron sputtering and using high power impulse magnetron sputtering

AU - Twu, M. J.

AU - Chiou, A. H.

AU - Hu, C. C.

AU - Hsu, C. Y.

AU - Kuo, C. G.

PY - 2015/7/1

Y1 - 2015/7/1

N2 - Abstract Mixture phases of anatase and rutile, TiO2 thin films are deposited on flexible polyethylene terephthalate (PET) substrates by direct current magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS), using a ceramic TiO2 target in an argon gas environment, at temperatures ranging from room to 150 C. The Taguchi method for the design of a robust experiment, with an orthogonal array, a signal-to-noise ratio and an analysis of variance are used to analyze the performance characteristics of the deposition parameters. This study determines the effect of the deposition parameters, such as the dc power (W), the sputtering pressure (Pa) and the substrate temperature (C) on the structural and photocatalytic characteristics of the TiO2 films. For both dcMS- and HiPIMS-grown films, the (110), (200) and (210) peaks of the rutile structure and the (200) peak of the anatase structure are observed. Compared to the coatings onto PET substrates using dcMS, the samples deposited using HiPIMS exhibited excellent photoinduced hydrophilicity and high photocatalytic activity. The contact angles are decreased to less than 4.1 after UV irradiation for 9 min, and the absorbance of the methylene blue aqueous solution is reduced to 0.3 for 240 min UV irradiation. Furthermore, the XRD diffraction peaks of the TiO2 films using HiPIMS become sharper and more intense, which demonstrates that the crystalline structure of the TiO2 films is improved. Higher visible-light photocatalytic efficiency was achieved with HiPIMS technique.

AB - Abstract Mixture phases of anatase and rutile, TiO2 thin films are deposited on flexible polyethylene terephthalate (PET) substrates by direct current magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS), using a ceramic TiO2 target in an argon gas environment, at temperatures ranging from room to 150 C. The Taguchi method for the design of a robust experiment, with an orthogonal array, a signal-to-noise ratio and an analysis of variance are used to analyze the performance characteristics of the deposition parameters. This study determines the effect of the deposition parameters, such as the dc power (W), the sputtering pressure (Pa) and the substrate temperature (C) on the structural and photocatalytic characteristics of the TiO2 films. For both dcMS- and HiPIMS-grown films, the (110), (200) and (210) peaks of the rutile structure and the (200) peak of the anatase structure are observed. Compared to the coatings onto PET substrates using dcMS, the samples deposited using HiPIMS exhibited excellent photoinduced hydrophilicity and high photocatalytic activity. The contact angles are decreased to less than 4.1 after UV irradiation for 9 min, and the absorbance of the methylene blue aqueous solution is reduced to 0.3 for 240 min UV irradiation. Furthermore, the XRD diffraction peaks of the TiO2 films using HiPIMS become sharper and more intense, which demonstrates that the crystalline structure of the TiO2 films is improved. Higher visible-light photocatalytic efficiency was achieved with HiPIMS technique.

KW - Flexible substrates

KW - HiPIMS

KW - Taguchi method

KW - TiO films

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