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Properties and reliability of ultrathin oxides grown on four inch diameter silicon wafers by microwave plasma afterglow oxidation
Cheng Rong Chen*, Shu Fen Hu, Po Ching Chen, Huey Liang Hwang, Liang Choo Hsia
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
2
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(Scopus)