Properties and reliability of ultrathin oxides grown on four inch diameter silicon wafers by microwave plasma afterglow oxidation
- Cheng Rong Chen*
- , Shu Fen Hu
- , Po Ching Chen
- , Huey Liang Hwang
- , Liang Choo Hsia
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
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