Promoting of charged-device model/electrostatic discharge immunity in the dicing saw process

Mu Chun Wang, Chuan Hsi Liu*, Kuo Shu Huang, Zhen Ying Hsieh, Shuang Yuan Chen, Hsin Chia Yang, Chii Ruey Lin

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Polyimide (PI) dielectric as a heatproof material is commonly employed in the integrated circuit (IC) industry. In the dicing saw assembly process, de-ionized (D.I.) water which has a higher resistance is rubbed on PI material. Hence, negative electrostatic charges are generated and accumulated on gate oxide capacitor or p-n junction capacitor in each IC chip. Since the discharge path is isolated during this time, sufficient cumulated charges through some feasible electrical path will damage the IC devices in this process step. Such damaged ICs exhibit function failure. A CO2 gas flow under 2-3 kgw/cm2 gas pressure to form a weak carbonic acid in water is efficient to conduct out the accumulated charges and adequately prevent the charge damage on IC devices. The final-test yield in sub-micron analog power complementary metal-oxide-semiconductor (CMOS) ICs was impressively increased from 80% to 98%.

Original languageEnglish
Pages (from-to)839-846
Number of pages8
JournalMicroelectronics Reliability
Volume50
Issue number6
DOIs
Publication statusPublished - 2010 Jun

Keywords

  • Charged-device model
  • Complementary metal-oxide-semiconductor
  • Electrostatic discharges
  • Packaging
  • Semiconductor-insulator

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Safety, Risk, Reliability and Quality
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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