PMMA nanocolumn array fabricated by catalytic etching and nanomolding technique

Mao Jung Huang; Chii Rong Yang; Chun Ming Chang; Chun Ting Lin; Yu Hsiang Tang; Ming Hua Shiao; Yuang Cherng Chiou; Rong Tsong Lee

doi:10.1016/j.mee.2011.02.028

PMMA nanocolumn array fabricated by catalytic etching and nanomolding technique

Mao Jung Huang^*
, Chii Rong Yang
, Chun Ming Chang
, Chun Ting Lin
, Yu Hsiang Tang
, Ming Hua Shiao
, Yuang Cherng Chiou
, Rong Tsong Lee

^*Corresponding author for this work

Department of Mechatronic Engineering

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

This study presents a combined self-assembled nano-sphere lithography (SANL) and catalytic etching technique to cost-effectively form an arrayed nano-column on a silicon wafer. The highest aspect ratio of the column fabricated through catalytic etching in this study was approximately 41:1. The electroforming method can convert a silicon nano-column array to a nano-pore array in a metallic stamp. Finally, a hot embossing process was used to mold nano-column arrays on polymethyl methacrylate (PMMA) substrate. The resulting structured PMMA surface exhibited a contact angle of 99.8°.

Original language	English
Pages (from-to)	2576-2579
Number of pages	4
Journal	Microelectronic Engineering
Volume	88
Issue number	8
DOIs	https://doi.org/10.1016/j.mee.2011.02.028
Publication status	Published - 2011 Aug

Keywords

Catalytic etching
Nano-column
Nano-molding
SANL

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/j.mee.2011.02.028

Cite this

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title = "PMMA nanocolumn array fabricated by catalytic etching and nanomolding technique",

abstract = "This study presents a combined self-assembled nano-sphere lithography (SANL) and catalytic etching technique to cost-effectively form an arrayed nano-column on a silicon wafer. The highest aspect ratio of the column fabricated through catalytic etching in this study was approximately 41:1. The electroforming method can convert a silicon nano-column array to a nano-pore array in a metallic stamp. Finally, a hot embossing process was used to mold nano-column arrays on polymethyl methacrylate (PMMA) substrate. The resulting structured PMMA surface exhibited a contact angle of 99.8°.",

keywords = "Catalytic etching, Nano-column, Nano-molding, SANL",

author = "Huang, \{Mao Jung\} and Yang, \{Chii Rong\} and Chang, \{Chun Ming\} and Lin, \{Chun Ting\} and Tang, \{Yu Hsiang\} and Shiao, \{Ming Hua\} and Chiou, \{Yuang Cherng\} and Lee, \{Rong Tsong\}",

year = "2011",

month = aug,

doi = "10.1016/j.mee.2011.02.028",

language = "English",

volume = "88",

pages = "2576--2579",

journal = "Microelectronic Engineering",

issn = "0167-9317",

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TY - JOUR

T1 - PMMA nanocolumn array fabricated by catalytic etching and nanomolding technique

AU - Huang, Mao Jung

AU - Yang, Chii Rong

AU - Chang, Chun Ming

AU - Lin, Chun Ting

AU - Tang, Yu Hsiang

AU - Shiao, Ming Hua

AU - Chiou, Yuang Cherng

AU - Lee, Rong Tsong

PY - 2011/8

Y1 - 2011/8

N2 - This study presents a combined self-assembled nano-sphere lithography (SANL) and catalytic etching technique to cost-effectively form an arrayed nano-column on a silicon wafer. The highest aspect ratio of the column fabricated through catalytic etching in this study was approximately 41:1. The electroforming method can convert a silicon nano-column array to a nano-pore array in a metallic stamp. Finally, a hot embossing process was used to mold nano-column arrays on polymethyl methacrylate (PMMA) substrate. The resulting structured PMMA surface exhibited a contact angle of 99.8°.

AB - This study presents a combined self-assembled nano-sphere lithography (SANL) and catalytic etching technique to cost-effectively form an arrayed nano-column on a silicon wafer. The highest aspect ratio of the column fabricated through catalytic etching in this study was approximately 41:1. The electroforming method can convert a silicon nano-column array to a nano-pore array in a metallic stamp. Finally, a hot embossing process was used to mold nano-column arrays on polymethyl methacrylate (PMMA) substrate. The resulting structured PMMA surface exhibited a contact angle of 99.8°.

KW - Catalytic etching

KW - Nano-column

KW - Nano-molding

KW - SANL

UR - https://www.scopus.com/pages/publications/79960050332

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U2 - 10.1016/j.mee.2011.02.028

DO - 10.1016/j.mee.2011.02.028

M3 - Article

AN - SCOPUS:79960050332

SN - 0167-9317

VL - 88

SP - 2576

EP - 2579

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 8

ER -

PMMA nanocolumn array fabricated by catalytic etching and nanomolding technique

Abstract

Keywords

ASJC Scopus subject areas

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