PMMA nanocolumn array fabricated by catalytic etching and nanomolding technique

Mao Jung Huang*, Chii Rong Yang, Chun Ming Chang, Chun Ting Lin, Yu Hsiang Tang, Ming Hua Shiao, Yuang Cherng Chiou, Rong Tsong Lee

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)


This study presents a combined self-assembled nano-sphere lithography (SANL) and catalytic etching technique to cost-effectively form an arrayed nano-column on a silicon wafer. The highest aspect ratio of the column fabricated through catalytic etching in this study was approximately 41:1. The electroforming method can convert a silicon nano-column array to a nano-pore array in a metallic stamp. Finally, a hot embossing process was used to mold nano-column arrays on polymethyl methacrylate (PMMA) substrate. The resulting structured PMMA surface exhibited a contact angle of 99.8°.

Original languageEnglish
Pages (from-to)2576-2579
Number of pages4
JournalMicroelectronic Engineering
Issue number8
Publication statusPublished - 2011 Aug


  • Catalytic etching
  • Nano-column
  • Nano-molding
  • SANL

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering


Dive into the research topics of 'PMMA nanocolumn array fabricated by catalytic etching and nanomolding technique'. Together they form a unique fingerprint.

Cite this