PMMA nanocolumn array fabricated by catalytic etching and nanomolding technique

Mao Jung Huang, Chii Rong Yang, Chun Ming Chang, Chun Ting Lin, Yu Hsiang Tang, Ming Hua Shiao, Yuang Cherng Chiou, Rong Tsong Lee

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

This study presents a combined self-assembled nano-sphere lithography (SANL) and catalytic etching technique to cost-effectively form an arrayed nano-column on a silicon wafer. The highest aspect ratio of the column fabricated through catalytic etching in this study was approximately 41:1. The electroforming method can convert a silicon nano-column array to a nano-pore array in a metallic stamp. Finally, a hot embossing process was used to mold nano-column arrays on polymethyl methacrylate (PMMA) substrate. The resulting structured PMMA surface exhibited a contact angle of 99.8°.

Original languageEnglish
Pages (from-to)2576-2579
Number of pages4
JournalMicroelectronic Engineering
Volume88
Issue number8
DOIs
Publication statusPublished - 2011 Aug 1

Keywords

  • Catalytic etching
  • Nano-column
  • Nano-molding
  • SANL

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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  • Cite this

    Huang, M. J., Yang, C. R., Chang, C. M., Lin, C. T., Tang, Y. H., Shiao, M. H., Chiou, Y. C., & Lee, R. T. (2011). PMMA nanocolumn array fabricated by catalytic etching and nanomolding technique. Microelectronic Engineering, 88(8), 2576-2579. https://doi.org/10.1016/j.mee.2011.02.028