Plasma-induced magnetic patterning of FePd thin films without and with exchange bias

Wei Hsiang Wang, Po Chun Chang, Pei hsun Jiang, Wen-Chin Lin

Research output: Contribution to journalArticle

Abstract

We demonstrate control of magnetic domain structures in continuous FePd thin films by patterning their surfaces with plasma treatment. The Fe-oxide layer formed on the surface upon ambient exposure of the FePd alloy thin film grown on an Al2O3(0001) substrate was patterned into microstructures by e-beam lithography followed by O2- or Ar-plasma treatment. Microscopic pinning of magnetic domain walls in the thin films is then observed by magneto-optic Kerr effect microscopy, with the magnetic field needed to reverse the magnetization of the plasma-treated areas being larger than that for the untreated areas. An intriguing competition between the uniaxial anisotropy and the exchange bias is also observed in the system. This study demonstrates that patterning of the film surface with plasma treatment can be an easy and efficient method for sophisticated engineering of magnetic structures in thin films, and therefore has potential application in developing future data-storage and spintronic devices.

Original languageEnglish
Article number146831
JournalApplied Surface Science
Volume527
DOIs
Publication statusPublished - 2020 Oct 15

Keywords

  • Exchange bias
  • Magnetic patterning
  • Magneto-optic Kerr effect microscopy
  • Plasma
  • Thin films

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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