Physical thickness 1.x nm ferroelectric HfZrOx negative capacitance FETs

M. H. Lee, S. T. Fan, C. H. Tang, P. G. Chen, Y. C. Chou, H. H. Chen, J. Y. Kuo, M. J. Xie, S. N. Liu, M. H. Liao, C. A. Jong, K. S. Li, M. C. Chen, C. W. Liu

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    59 Citations (Scopus)

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