INIS
films
100%
temperature range 0273-0400 k
100%
titanium oxides
100%
photocatalysis
100%
sputtering
100%
polycarbonates
100%
deposition
83%
power
66%
performance
50%
oxygen
33%
argon
33%
meters
16%
water
16%
increasing
16%
morphology
16%
scanning electron microscopy
16%
substrates
16%
x-ray diffraction
16%
spectroscopy
16%
thin films
16%
droplets
16%
Chemistry
Ambient Reaction Temperature
100%
Liquid Film
100%
Magnetron Sputtering
100%
Titanium Oxide
100%
Polycarbonate
100%
Photocatalytic
100%
Pressure
80%
Dioxygen
40%
Wetting
40%
Time
40%
Argon
40%
Structure
20%
X-Ray Diffraction
20%
Scanning Electron Microscopy
20%
UV/VIS Spectroscopy
20%
Deposition Process
20%
Titanium Dioxide
20%
Material Science
Temperature
100%
Magnetron Sputtering
100%
Contact Angle
40%
Morphology
20%
X-Ray Diffraction
20%
Scanning Electron Microscopy
20%
Droplet
20%
Thin Films
20%
Near Infrared Spectroscopy
20%
Ranking Factor
20%