Patterning of multilayer dielectric optical filters using metal masks fabricated by electroforming and photolithography

Cheng Chung Jaing, Chii-Rong Yang, Chun Ming Chang, Chao Te Lee, Chien Nan Hsiao

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Ni films, replacing photoresists, serve as masks in the selective deposition of optical thin films by electron-beam gun evaporation at a substrate temperature of 300°C. Photolithography is adopted herein to define the growth of Ni films by electroforming. Mosaic patterns with a width of 20 μm are employed as red color filters, which are longwave pass. These red filters are formed from alternate SiO2 and TiO2 layers and have a mean transmittance of (90%. The experimental results show that the combined use of photolithography, electroforming, and electron-beam gun evaporation can deposit miniaturized multilayer dielectric coatings with high light transmittance in a hot process.

Original languageEnglish
Article number033009
JournalJournal of Micro/Nanolithography, MEMS, and MOEMS
Volume8
Issue number3
DOIs
Publication statusPublished - 2009 Jan 1

Fingerprint

Electroforming
electroforming
Optical filters
optical filters
Photolithography
photolithography
Masks
Electron beams
transmittance
Multilayers
Evaporation
masks
Metals
evaporation
electron beams
Optical films
filters
Photoresists
photoresists
metals

Keywords

  • Electroforming
  • Electron-beam gun evaporation
  • Hot process
  • Mask
  • Miniaturized multilayer dielectric coatings
  • Photolithography

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Cite this

Patterning of multilayer dielectric optical filters using metal masks fabricated by electroforming and photolithography. / Jaing, Cheng Chung; Yang, Chii-Rong; Chang, Chun Ming; Lee, Chao Te; Hsiao, Chien Nan.

In: Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 8, No. 3, 033009, 01.01.2009.

Research output: Contribution to journalArticle

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