Patterning of multilayer dielectric optical filters using metal masks fabricated by electroforming and photolithography

Cheng Chung Jaing, Chii Rong Yang, Chun Ming Chang, Chao Te Lee, Chien Nan Hsiao

Research output: Contribution to journalArticle

2 Citations (Scopus)


Ni films, replacing photoresists, serve as masks in the selective deposition of optical thin films by electron-beam gun evaporation at a substrate temperature of 300°C. Photolithography is adopted herein to define the growth of Ni films by electroforming. Mosaic patterns with a width of 20 μm are employed as red color filters, which are longwave pass. These red filters are formed from alternate SiO2 and TiO2 layers and have a mean transmittance of (90%. The experimental results show that the combined use of photolithography, electroforming, and electron-beam gun evaporation can deposit miniaturized multilayer dielectric coatings with high light transmittance in a hot process.

Original languageEnglish
Article number033009
JournalJournal of Micro/Nanolithography, MEMS, and MOEMS
Issue number3
Publication statusPublished - 2009 Jan 1



  • Electroforming
  • Electron-beam gun evaporation
  • Hot process
  • Mask
  • Miniaturized multilayer dielectric coatings
  • Photolithography

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Cite this