INIS
films
100%
growth
100%
configuration
100%
sputtering
100%
substrates
71%
gases
57%
oxygen
28%
magnesium oxides
28%
transport
14%
distance
14%
mixtures
14%
x-ray diffraction
14%
transition temperature
14%
thin films
14%
microscopy
14%
Physics
Substrates
100%
Growth
100%
Gaseous State
80%
Temperature
40%
Pressure
40%
Electrical Resistivity
40%
Targets
40%
Ratios
20%
X Ray Diffraction
20%
Transition Temperature
20%
Transport Properties
20%
Thin Films
20%
Microscopy
20%
Distance
20%
Chemistry
Liquid Film
100%
Gas
80%
Reaction Temperature
60%
Pressure
40%
Resistivity
40%
X-Ray Diffraction
20%
Mixture
20%
Phase Composition
20%
Transport Property
20%
Optical Microscopy
20%
Resistance
20%
Biochemistry, Genetics and Molecular Biology
Growth
100%
Gas
100%
Temperature
50%
Pressure
50%
Force
25%
X Ray Diffraction
25%
Transition Temperature
25%
Microscopy
25%
Material Science
Gas
100%
Temperature
75%
Magnesium Oxide
50%
Electrical Resistivity
50%
X-Ray Diffraction
25%
Thin Films
25%
Mixture
25%