Optimization of Defects in Monolayer MoS2 via Femtosecond Laser Annealing

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In recent years, two-dimensional materials have emerged as a hot research area for semiconductor development and related technologies, paving the way for new directions and possibilities. Among these materials, transition metal dichalcogenides (TMDs) are particularly promising candidates for integrated circuits due to their highly suitable band gap sizes, especially in the context of field-effect transistors (FETs). In the realm of TMDs, molybdenum disulfide (MoS2) and tungsten diselenide (WSe2) have become potential channel materials. However, challenges such as damage, crystallization defects, and imaging issues during the preparation of 2D materials can lead to issues like poor conductivity, inadequate luminescence, instability, and leakage currents. To tackle these challenges, this study focuses on monolayer MoS2 among 2D materials, employing femtosecond laser pulse annealing to rapidly anneal crystals that are defective or damaged. This technique aims to optimize the crystal structure by addressing any defects that may arise during the growth process. Photoluminescence (PL) and Raman spectroscopy serve as detection systems in this research, used to examine the changes in 2D materials before and after annealing, providing valuable insights into their quality and structural integrity. This novel femtosecond pulse annealing technique greatly aids in the fabrication of 3D integrated circuits, as many materials used in 3D IC are two-dimensional. By replacing traditional thermal annealing techniques with femtosecond laser pulse annealing, this method not only eliminates the thermal effects and time-consuming nature associated with conventional annealing, but also harnesses concentrated pulsed laser to achieve rapid thermal processing. This approach effectively suppresses surface defects and enhances characteristics such as conductivity, luminescence, and stability, making it a powerful advancement in next-generation semiconductor technology.

Original languageEnglish
Title of host publicationNanoscale and Quantum Materials
Subtitle of host publicationFrom Synthesis and Laser Processing to Applications 2025
EditorsAndrei V. Kabashin, Maria Farsari, Masoud Mahjouri-Samani
PublisherSPIE
ISBN (Electronic)9781510684522
DOIs
Publication statusPublished - 2025
EventNanoscale and Quantum Materials: From Synthesis and Laser Processing to Applications 2025 - San Francisco, United States
Duration: 2025 Jan 252025 Jan 27

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume13352
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceNanoscale and Quantum Materials: From Synthesis and Laser Processing to Applications 2025
Country/TerritoryUnited States
CitySan Francisco
Period2025/01/252025/01/27

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

  1. SDG 3 - Good Health and Well-being
    SDG 3 Good Health and Well-being

Keywords

  • 2D materials
  • MoS2
  • femtosecond pulsed laser
  • laser annealing

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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