Optical and transport properties of MOCVD-grown InSb thin films

T. R. Yang, G. Kuri, M. R. Kim, Z. C. Feng, S. J. Chua

Research output: Contribution to journalConference article

Abstract

In this work we present optical investigations of metalorganic chemical vapor deposition (MOCVD) grown InSb thin films on GaAs(100) substrates and MeV ion implanted InSb(111) bulk crystals. Far-infrared (FIR) reflectance spectroscopy has been used to study the lattice vibration behavior of all the samples. For the MOCVD films the effects of III-V source ratios on the films crystalline quality have been reported. Two additional weak modes in the wavenumber regions of 210-240 cm-1 are observed and they appeared more prominent at low temperatures. Interference fringe effects modify the FIR reflectance band of the GaAs substrate. They are related to the uniformity of film thickness and crystalline perfection. The relationship between these interference features and film quality as well as thickness uniformity was obtained from the measured spectra. The carrier concentration, mobility, effective mass as well as the dielectric constant of these films have been determined. For the bulk InSb crystals, high energy C+ ions have been implanted at MeV energies and, the optical as well as transport properties of the implanted layers have been presented and discussed.

Original languageEnglish
Pages (from-to)664-671
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4078
Publication statusPublished - 2000 Jan 1
EventOptoelectronic Materials and Devices II - Taipei, Taiwan
Duration: 2000 Jul 262000 Jul 28

Fingerprint

Chemical Vapor Deposition
Metallorganic chemical vapor deposition
Transport Properties
Transport properties
Optical Properties
metalorganic chemical vapor deposition
Thin Films
Optical properties
transport properties
optical properties
Thin films
thin films
Gallium Arsenide
Reflectance
Uniformity
Ions
Crystalline materials
Infrared radiation
reflectance
interference

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Optical and transport properties of MOCVD-grown InSb thin films. / Yang, T. R.; Kuri, G.; Kim, M. R.; Feng, Z. C.; Chua, S. J.

In: Proceedings of SPIE - The International Society for Optical Engineering, Vol. 4078, 01.01.2000, p. 664-671.

Research output: Contribution to journalConference article

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AU - Yang, T. R.

AU - Kuri, G.

AU - Kim, M. R.

AU - Feng, Z. C.

AU - Chua, S. J.

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N2 - In this work we present optical investigations of metalorganic chemical vapor deposition (MOCVD) grown InSb thin films on GaAs(100) substrates and MeV ion implanted InSb(111) bulk crystals. Far-infrared (FIR) reflectance spectroscopy has been used to study the lattice vibration behavior of all the samples. For the MOCVD films the effects of III-V source ratios on the films crystalline quality have been reported. Two additional weak modes in the wavenumber regions of 210-240 cm-1 are observed and they appeared more prominent at low temperatures. Interference fringe effects modify the FIR reflectance band of the GaAs substrate. They are related to the uniformity of film thickness and crystalline perfection. The relationship between these interference features and film quality as well as thickness uniformity was obtained from the measured spectra. The carrier concentration, mobility, effective mass as well as the dielectric constant of these films have been determined. For the bulk InSb crystals, high energy C+ ions have been implanted at MeV energies and, the optical as well as transport properties of the implanted layers have been presented and discussed.

AB - In this work we present optical investigations of metalorganic chemical vapor deposition (MOCVD) grown InSb thin films on GaAs(100) substrates and MeV ion implanted InSb(111) bulk crystals. Far-infrared (FIR) reflectance spectroscopy has been used to study the lattice vibration behavior of all the samples. For the MOCVD films the effects of III-V source ratios on the films crystalline quality have been reported. Two additional weak modes in the wavenumber regions of 210-240 cm-1 are observed and they appeared more prominent at low temperatures. Interference fringe effects modify the FIR reflectance band of the GaAs substrate. They are related to the uniformity of film thickness and crystalline perfection. The relationship between these interference features and film quality as well as thickness uniformity was obtained from the measured spectra. The carrier concentration, mobility, effective mass as well as the dielectric constant of these films have been determined. For the bulk InSb crystals, high energy C+ ions have been implanted at MeV energies and, the optical as well as transport properties of the implanted layers have been presented and discussed.

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