Novel positive-tone thick photoresist for high aspect ratio microsystem technology

  • G. W. Hsieh
  • , Y. S. Hsieh
  • , C. R. Yang
  • , Y. D. Lee*
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Novel positive-tone thick photoresist for high aspect ratio microsystem technology'. Together they form a unique fingerprint.

INIS

Material Science