National Project on 45 to 32 nm metal oxide semiconductor field effect transistors for next century IC fabrications

Huey Liang Hwang, C. W. Wang, K. H. Chang, C. H. Tsai, K. C. Leou, Kuei Shu Chang-Liao, Chun Chang Lu, S. C. Chang, F. C. Chiu, C. H. Liu, Albert Chin, Kow Ming Chang, Bwo Ning Chen

Research output: Chapter in Book/Report/Conference proceedingConference contribution

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Engineering & Materials Science