Nanotribological properties of ALD-processed bilayer TiO2/ZnO films

Wun Kai Wang, Hua Chiang Wen, Chun-Hu Cheng, Ching Hua Hung, Wu Ching Chou, Wei Hung Yau, Ping Feng Yang, Yi Shao Lai

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

TiO2/ZnO films grown by atomic layer deposition (ALD) demonstrated nanotribological behaviors using scratch testing. TEM profiles obtained an amorphous structure TiO2 and nanocrystalline structure ZnO, whereas the sample has significant interface between the TiO2/ZnO films. The experimental results show the relative XRD peak intensities are mainly contributed by a wurtzite oxide ZnO structure and no signal from the amorphous TiO2. With respect to tribology, increased friction causes plastic deformation between the TiO2 and ZnO films, in addition to delamination and particle loosening. The plastic deformation caused by adhesion and/or cohesion failure is reflected in the nanoscratch traces. The pile-up events at a loading penetration of 30 nm were measured at 21.8 μN for RT, 22.4 μN for 300°C, and 36 μN for 400°C. In comparison to the other conditions, the TiO2/ZnO films annealed at 400°C exhibited higher scratch resistance and friction with large debris, indicating the wear volume is reduced with increased annealing temperature and loading.

Original languageEnglish
Pages (from-to)2754-2759
Number of pages6
JournalMicroelectronics Reliability
Volume54
Issue number12
DOIs
Publication statusPublished - 2014 Dec 1

Fingerprint

Atomic layer deposition
atomic layer epitaxy
plastic deformation
Plastic deformation
friction
Friction
nanostructure (characteristics)
tribology
cohesion
Tribology
high resistance
piles
debris
Delamination
Debris
wurtzite
Oxides
Piles
adhesion
Adhesion

Keywords

  • CVD coatings
  • Nanotribology
  • Scratch testing
  • Sliding friction

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Safety, Risk, Reliability and Quality
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

Cite this

Wang, W. K., Wen, H. C., Cheng, C-H., Hung, C. H., Chou, W. C., Yau, W. H., ... Lai, Y. S. (2014). Nanotribological properties of ALD-processed bilayer TiO2/ZnO films. Microelectronics Reliability, 54(12), 2754-2759. https://doi.org/10.1016/j.microrel.2014.07.148

Nanotribological properties of ALD-processed bilayer TiO2/ZnO films. / Wang, Wun Kai; Wen, Hua Chiang; Cheng, Chun-Hu; Hung, Ching Hua; Chou, Wu Ching; Yau, Wei Hung; Yang, Ping Feng; Lai, Yi Shao.

In: Microelectronics Reliability, Vol. 54, No. 12, 01.12.2014, p. 2754-2759.

Research output: Contribution to journalArticle

Wang, WK, Wen, HC, Cheng, C-H, Hung, CH, Chou, WC, Yau, WH, Yang, PF & Lai, YS 2014, 'Nanotribological properties of ALD-processed bilayer TiO2/ZnO films', Microelectronics Reliability, vol. 54, no. 12, pp. 2754-2759. https://doi.org/10.1016/j.microrel.2014.07.148
Wang, Wun Kai ; Wen, Hua Chiang ; Cheng, Chun-Hu ; Hung, Ching Hua ; Chou, Wu Ching ; Yau, Wei Hung ; Yang, Ping Feng ; Lai, Yi Shao. / Nanotribological properties of ALD-processed bilayer TiO2/ZnO films. In: Microelectronics Reliability. 2014 ; Vol. 54, No. 12. pp. 2754-2759.
@article{b097c8037c834f35a4fd8c1c9daa3c05,
title = "Nanotribological properties of ALD-processed bilayer TiO2/ZnO films",
abstract = "TiO2/ZnO films grown by atomic layer deposition (ALD) demonstrated nanotribological behaviors using scratch testing. TEM profiles obtained an amorphous structure TiO2 and nanocrystalline structure ZnO, whereas the sample has significant interface between the TiO2/ZnO films. The experimental results show the relative XRD peak intensities are mainly contributed by a wurtzite oxide ZnO structure and no signal from the amorphous TiO2. With respect to tribology, increased friction causes plastic deformation between the TiO2 and ZnO films, in addition to delamination and particle loosening. The plastic deformation caused by adhesion and/or cohesion failure is reflected in the nanoscratch traces. The pile-up events at a loading penetration of 30 nm were measured at 21.8 μN for RT, 22.4 μN for 300°C, and 36 μN for 400°C. In comparison to the other conditions, the TiO2/ZnO films annealed at 400°C exhibited higher scratch resistance and friction with large debris, indicating the wear volume is reduced with increased annealing temperature and loading.",
keywords = "CVD coatings, Nanotribology, Scratch testing, Sliding friction",
author = "Wang, {Wun Kai} and Wen, {Hua Chiang} and Chun-Hu Cheng and Hung, {Ching Hua} and Chou, {Wu Ching} and Yau, {Wei Hung} and Yang, {Ping Feng} and Lai, {Yi Shao}",
year = "2014",
month = "12",
day = "1",
doi = "10.1016/j.microrel.2014.07.148",
language = "English",
volume = "54",
pages = "2754--2759",
journal = "Microelectronics and Reliability",
issn = "0026-2714",
publisher = "Elsevier Limited",
number = "12",

}

TY - JOUR

T1 - Nanotribological properties of ALD-processed bilayer TiO2/ZnO films

AU - Wang, Wun Kai

AU - Wen, Hua Chiang

AU - Cheng, Chun-Hu

AU - Hung, Ching Hua

AU - Chou, Wu Ching

AU - Yau, Wei Hung

AU - Yang, Ping Feng

AU - Lai, Yi Shao

PY - 2014/12/1

Y1 - 2014/12/1

N2 - TiO2/ZnO films grown by atomic layer deposition (ALD) demonstrated nanotribological behaviors using scratch testing. TEM profiles obtained an amorphous structure TiO2 and nanocrystalline structure ZnO, whereas the sample has significant interface between the TiO2/ZnO films. The experimental results show the relative XRD peak intensities are mainly contributed by a wurtzite oxide ZnO structure and no signal from the amorphous TiO2. With respect to tribology, increased friction causes plastic deformation between the TiO2 and ZnO films, in addition to delamination and particle loosening. The plastic deformation caused by adhesion and/or cohesion failure is reflected in the nanoscratch traces. The pile-up events at a loading penetration of 30 nm were measured at 21.8 μN for RT, 22.4 μN for 300°C, and 36 μN for 400°C. In comparison to the other conditions, the TiO2/ZnO films annealed at 400°C exhibited higher scratch resistance and friction with large debris, indicating the wear volume is reduced with increased annealing temperature and loading.

AB - TiO2/ZnO films grown by atomic layer deposition (ALD) demonstrated nanotribological behaviors using scratch testing. TEM profiles obtained an amorphous structure TiO2 and nanocrystalline structure ZnO, whereas the sample has significant interface between the TiO2/ZnO films. The experimental results show the relative XRD peak intensities are mainly contributed by a wurtzite oxide ZnO structure and no signal from the amorphous TiO2. With respect to tribology, increased friction causes plastic deformation between the TiO2 and ZnO films, in addition to delamination and particle loosening. The plastic deformation caused by adhesion and/or cohesion failure is reflected in the nanoscratch traces. The pile-up events at a loading penetration of 30 nm were measured at 21.8 μN for RT, 22.4 μN for 300°C, and 36 μN for 400°C. In comparison to the other conditions, the TiO2/ZnO films annealed at 400°C exhibited higher scratch resistance and friction with large debris, indicating the wear volume is reduced with increased annealing temperature and loading.

KW - CVD coatings

KW - Nanotribology

KW - Scratch testing

KW - Sliding friction

UR - http://www.scopus.com/inward/record.url?scp=84913616688&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84913616688&partnerID=8YFLogxK

U2 - 10.1016/j.microrel.2014.07.148

DO - 10.1016/j.microrel.2014.07.148

M3 - Article

AN - SCOPUS:84913616688

VL - 54

SP - 2754

EP - 2759

JO - Microelectronics and Reliability

JF - Microelectronics and Reliability

SN - 0026-2714

IS - 12

ER -