Nanotribological behavior of ZnO films prepared by atomic layer deposition

Wun Kai Wang, Hua Chiang Wen, Chun Hu Cheng, Wu Ching Chou, Wei Hung Yau*, Ching Hua Hung, Chang Pin Chou

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)


We used atomic layer deposition to form ZnO thin-film coatings on Si substrates and then evaluate the effect of pile-up using the nanoscratch technique under a ramped mode. The wear volume decreased with increasing annealing temperature from room temperature to 400 C for a given load. Elastic-to-plastic deformation occurred during sliding scratch processing between the groove and film for loading penetration of 30 nm. The onset of non-elastic behavior and greater contact pressure were evident for loading penetration of 150 nm; thus, full plastic deformation occurred as a result of a substrate effect. We suspect that elastic-plastic failure events were related to edge bulging between the groove and film, with elastic-plastic deformation attributable to adhesion discontinuities and/or cohesion failure of the ZnO films.

Original languageEnglish
Pages (from-to)334-338
Number of pages5
JournalJournal of Physics and Chemistry of Solids
Issue number3
Publication statusPublished - 2014 Mar


  • A. Thin films
  • B. Vapor deposition
  • C. Mechanical properties

ASJC Scopus subject areas

  • General Chemistry
  • General Materials Science
  • Condensed Matter Physics


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