Nanotribological behavior of ZnO films prepared by atomic layer deposition

Wun Kai Wang, Hua Chiang Wen, Chun Hu Cheng, Wu Ching Chou, Wei Hung Yau, Ching Hua Hung, Chang Pin Chou

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)


We used atomic layer deposition to form ZnO thin-film coatings on Si substrates and then evaluate the effect of pile-up using the nanoscratch technique under a ramped mode. The wear volume decreased with increasing annealing temperature from room temperature to 400 C for a given load. Elastic-to-plastic deformation occurred during sliding scratch processing between the groove and film for loading penetration of 30 nm. The onset of non-elastic behavior and greater contact pressure were evident for loading penetration of 150 nm; thus, full plastic deformation occurred as a result of a substrate effect. We suspect that elastic-plastic failure events were related to edge bulging between the groove and film, with elastic-plastic deformation attributable to adhesion discontinuities and/or cohesion failure of the ZnO films.

Original languageEnglish
Pages (from-to)334-338
Number of pages5
JournalJournal of Physics and Chemistry of Solids
Issue number3
Publication statusPublished - 2014 Mar


  • A. Thin films
  • B. Vapor deposition
  • C. Mechanical properties

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics


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