Morphology and magnetism of CoPd coverage on MoS 2 flakes/SiO 2

Chuan Che Hsu, Chak Ming Liu, Zong You Lin, Wen Chin Lin

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

CoPd alloy nanostructures and thin films were deposited on MoS 2 flakes through e-beam evaporation at a high temperature (HT) (500 K) and at room temperature (RT) (300 K). In HT growth, CoPd nanoparticles assembled at the edge of the MoS 2 flake. The nanoparticles formed parallel chains at the edge of each layer in multilayered MoS 2 . As indicated by the quenched photoluminescence, HT deposition resulted in a flat CoPd coverage with a roughness of ≤±0.5 nm on a MoS 2 terrace. By contrast, RT growth led to a relatively rough CoPd thin film on MoS 2 (roughness ≤±2 nm). The film comprised a merged nanoparticle assembly. The MoS 2 /SiO 2 step edge played a crucial role in magnetic domain pinning such that the magnetic coercivity (H c ) of Pd/Co/MoS 2 was smaller than that of Pd/Co/SiO 2 . Similarly, RT CoPd (8 nm)/MoS 2 exhibited a parallelogram-shaped hysteresis loop with a relatively small H c value compared with that of the square hysteresis loops of RT CoPd (8 nm)/SiO 2 . The hydrogenation of RT CoPd (8 nm)/MoS 2 resulted in reversible H c enhancement.

Original languageEnglish
Pages (from-to)436-444
Number of pages9
JournalJournal of Alloys and Compounds
Volume785
DOIs
Publication statusPublished - 2019 May 15

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Keywords

  • Magnetic alloy
  • MoS
  • Surface
  • Thin film

ASJC Scopus subject areas

  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys
  • Materials Chemistry

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