Modulation of magnetic anisotropy in Fe/Si(111) thin films through interface property

Wen Chin Lin; Tsung Ying Ho; Chiao Sung Chi; Cheng Jui Tsai

doi:10.1016/j.tsf.2013.06.083

Modulation of magnetic anisotropy in Fe/Si(111) thin films through interface property

Wen Chin Lin, Tsung Ying Ho, Chiao Sung Chi, Cheng Jui Tsai

Department of Physics

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

The magnetic anisotropy of Fe thin films grown on Si(111) was controlled by either oblique deposition of Fe or using an intermediate layer between the Fe film and Si substrate. By 45 and 65 off-normal deposition of Fe, a clear uniaxial magnetic anisotropy was observed in Pd capped Fe/Si(111) films. This uniaxial magnetic anisotropy dominated the magnetic switching behavior, as well as the magnetic hysteresis loops. In contrast to Fe/Si(111) and Fe/Pd-Si/Si(111), a 600 C-annealed Fe-Si intermediate layer enhanced the coercivity (H_c) of the Fe film from 4 × 10³ to 10 × 10³ A/m. The simple methods of oblique deposition and suitable intermediate layer modulated the magnetic behavior of magnetic Fe thin films on Si(111) and are valuable for future applications.

Original language	English
Pages (from-to)	355-359
Number of pages	5
Journal	Thin Solid Films
Volume	542
DOIs	https://doi.org/10.1016/j.tsf.2013.06.083
Publication status	Published - 2013 Sep 2

Keywords

Magnetic anisotropy
Magnetism
Oblique deposition

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/j.tsf.2013.06.083

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title = "Modulation of magnetic anisotropy in Fe/Si(111) thin films through interface property",

abstract = "The magnetic anisotropy of Fe thin films grown on Si(111) was controlled by either oblique deposition of Fe or using an intermediate layer between the Fe film and Si substrate. By 45 and 65 off-normal deposition of Fe, a clear uniaxial magnetic anisotropy was observed in Pd capped Fe/Si(111) films. This uniaxial magnetic anisotropy dominated the magnetic switching behavior, as well as the magnetic hysteresis loops. In contrast to Fe/Si(111) and Fe/Pd-Si/Si(111), a 600 C-annealed Fe-Si intermediate layer enhanced the coercivity (Hc) of the Fe film from 4 × 103 to 10 × 103 A/m. The simple methods of oblique deposition and suitable intermediate layer modulated the magnetic behavior of magnetic Fe thin films on Si(111) and are valuable for future applications.",

keywords = "Magnetic anisotropy, Magnetism, Oblique deposition",

author = "Lin, {Wen Chin} and Ho, {Tsung Ying} and Chi, {Chiao Sung} and Tsai, {Cheng Jui}",

note = "Funding Information: This work was supported by the National Science Council of Taiwan under grant nos. NSC 99-2112-M-003-009-MY3 . Copyright: Copyright 2013 Elsevier B.V., All rights reserved.",

year = "2013",

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doi = "10.1016/j.tsf.2013.06.083",

language = "English",

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T1 - Modulation of magnetic anisotropy in Fe/Si(111) thin films through interface property

AU - Lin, Wen Chin

AU - Ho, Tsung Ying

AU - Chi, Chiao Sung

AU - Tsai, Cheng Jui

PY - 2013/9/2

Y1 - 2013/9/2

N2 - The magnetic anisotropy of Fe thin films grown on Si(111) was controlled by either oblique deposition of Fe or using an intermediate layer between the Fe film and Si substrate. By 45 and 65 off-normal deposition of Fe, a clear uniaxial magnetic anisotropy was observed in Pd capped Fe/Si(111) films. This uniaxial magnetic anisotropy dominated the magnetic switching behavior, as well as the magnetic hysteresis loops. In contrast to Fe/Si(111) and Fe/Pd-Si/Si(111), a 600 C-annealed Fe-Si intermediate layer enhanced the coercivity (Hc) of the Fe film from 4 × 103 to 10 × 103 A/m. The simple methods of oblique deposition and suitable intermediate layer modulated the magnetic behavior of magnetic Fe thin films on Si(111) and are valuable for future applications.

AB - The magnetic anisotropy of Fe thin films grown on Si(111) was controlled by either oblique deposition of Fe or using an intermediate layer between the Fe film and Si substrate. By 45 and 65 off-normal deposition of Fe, a clear uniaxial magnetic anisotropy was observed in Pd capped Fe/Si(111) films. This uniaxial magnetic anisotropy dominated the magnetic switching behavior, as well as the magnetic hysteresis loops. In contrast to Fe/Si(111) and Fe/Pd-Si/Si(111), a 600 C-annealed Fe-Si intermediate layer enhanced the coercivity (Hc) of the Fe film from 4 × 103 to 10 × 103 A/m. The simple methods of oblique deposition and suitable intermediate layer modulated the magnetic behavior of magnetic Fe thin films on Si(111) and are valuable for future applications.

KW - Magnetic anisotropy

KW - Magnetism

KW - Oblique deposition

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Modulation of magnetic anisotropy in Fe/Si(111) thin films through interface property

Abstract

Keywords

ASJC Scopus subject areas

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