Miniaturized multilayer dielectric coatings using metal masks fabricated by electroforming and photolithography technologies

Cheng Chung Jaing, Chii-Rong Yang, Chun Ming Chang, Yung Hsin Chang, Chao Te Lee, Chine Nan Hsiao

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The Ni films replacing photoresist serve as a mask to selectively deposit optical thin films at a substrate temperature of 300°C by an electron-beam gun evaporation. The photolithograph is used to define the growth of Ni films by an electroforming technique. Mosaic patterns with a width of 20μm are chosen as an arrangement of red color filters. The red filters are formed of alternate SiO2 and TiO2 layers and the average transmittance of red filters is larger than 90%. The experimental results successfully illustrate that the combinative uses of photolithography, electroforming and electron-beam gun evaporation can make miniaturized multilayer dielectric coatings with high light transmittance in a hot deposition.

Original languageEnglish
Title of host publicationAdvances in Thin-Film Coatings for Optical Applications V
DOIs
Publication statusPublished - 2008 Dec 19
EventAdvances in Thin-Film Coatings for Optical Applications V - San Diego, CA, United States
Duration: 2008 Aug 112008 Aug 11

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume7067
ISSN (Print)0277-786X

Other

OtherAdvances in Thin-Film Coatings for Optical Applications V
CountryUnited States
CitySan Diego, CA
Period08/8/1108/8/11

Keywords

  • Electroforming
  • Electron-beam gun evaporation
  • Hot deposition
  • Mask
  • Miniaturized multilayer dielectric coatings
  • Photolithography

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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