Metal-insulator transition characteristics of Mo-and Mn-doped VO 2 films fabricated by magnetron cosputtering technique

Shiu Jen Liu, Hau Wei Fang, Yu Tai Su, Jang Hsing Hsieh

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23 Citations (Scopus)

Abstract

Mo-and Mn-doped VO2 thin films have been grown on c-cut sapphire substrates by the magnetron co-sputtering technique. The effects of Mo and Mn doping on the structure and metal-insulator transition of the doped VO 2 thin films were studied. An enlargement of the out-of-plane lattice constant of the film caused by Mo doping was observed. As expected, the transition temperature (TMI) is reduced by Mo doping. However, the valence of the Mo ions doped in the VO2 films is determined by X-ray photoelectron spectroscopy to be 6+ on the surface, but 4+ and 3+ in the bulk part of the films. The reduction in TMI observed in this study is attributed to the variation in the band structure resulting from the incorporation of Mo 4+ into the VO2 lattice. The optical transmission is remarkably enhanced by low-concentration Mo doping and then monotonically decreases with increasing Mo content. On the other hand, the out-of-plane lattice constant and TMI are not affected by Mn doping. The transmission is enhanced and then monotonically increases with increasing Mn concentration. The thermochromism of doped films is suppressed by Mo and Mn doping.

Original languageEnglish
Article number063201
JournalJapanese Journal of Applied Physics
Volume53
Issue number6
DOIs
Publication statusPublished - 2014 Jun

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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