Mechanism and process dependence of negative bias temperature instability (NBTI) for pMOSFETs with ultrathin gate dielectrics
- Chuan H. Liu
- , Ming T. Lee
- , Chin Yung Lin
- , Jenkon Chen
- , Klaus Schruefer
- , James Brighten
- , Nivo Rovedo
- , Terence B. Hook
- , Mukesh V. Khare
- , Shih Fen Huang
- , Clement Wann
- , Tze Chiang Chen
- , Tak H. Ning
Research output: Contribution to journal › Article › peer-review
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