Mechanical property effects of Si1 - XGex channel and stressed contact etching stop layer on nano-scaled n-type metal-oxide- semiconductor field effect transistors

Chang Chun Lee, Hsien Chie Cheng, Hung Wen Hsu, Zih Han Chen, Hsiao Hsuan Teng, Chuan His Liu

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Mechanical property effects of Si<sub>1 - X</sub>Ge<sub>x</sub> channel and stressed contact etching stop layer on nano-scaled n-type metal-oxide- semiconductor field effect transistors'. Together they form a unique fingerprint.

Physics & Astronomy

Engineering & Materials Science

Chemical Compounds