Mcroraman study of Ge/Si quantum rings and dots

V. I. Mashanov*, H. H. Cheng, L. J. Chen, C. T. Chia

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The fabrication and optical measurement of Ge/Si nanostructure was presented. The atomic force microscopy (AFM) was employed to probe the surface morphology, which shows both quantum dots (QD) and quantum rings (QR) shape Ge nanostructure. MicroRaman was performed to characterize the strain and composition QD and QR. The samples were grown by solid source molecular beam epitaxy (MBE) with electron beam evaporators for both Ge and Si. MicroRaman measurements were performed at room temperature and wavelength of 514.5 nm from Ar+ laser was used as the excitation source. The intensity of both Ge-Ge and Si-Ge modes decrease as growth temperature increase. Peak position of the Si-Ge line remains at the same position within ±1 cm-1.

Original languageEnglish
Title of host publication2004 1st IEEE International Conference on Group IV Photonics
Pages113-114
Number of pages2
Publication statusPublished - 2004
Event2004 1st IEEE International Conference on Group IV Photonics - Hong Kong, China, Hong Kong
Duration: 2004 Sept 292004 Oct 1

Publication series

Name2004 1st IEEE International Conference on Group IV Photonics

Other

Other2004 1st IEEE International Conference on Group IV Photonics
Country/TerritoryHong Kong
CityHong Kong, China
Period2004/09/292004/10/01

ASJC Scopus subject areas

  • General Engineering

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