Magnetic patterning through graphene protection against oxidation and interlayer diffusion

Chak Ming Liu, Wei Hsiang Wang, Pei Hsun Jiang, Wen Chin Lin

Research output: Contribution to journalArticle

Abstract

Graphene (Gr) has been demonstrated to protect metallic thin films against oxidation. Based on this idea, we propose a new method to fabricate microstructured magnetic domains using patterned single-layer Gr. In the first experiment, single-layer Gr was transferred onto a CoPd alloy film pregrown on a SiO2/Si(001) substrate. Subsequently, the single-layer Gr was patterned through electron beam lithography followed by oxygen plasma etching to expose selective micron-sized areas of CoPd. The exposed areas of CoPd were more easily oxidized compared to the areas protected by Gr, which is found to result in significant magnetic contrast between the protected and surface-oxidized areas of CoPd. In the second experiment, a lithographically-patterned Gr layer was placed between the Fe and CoPd layers to block interlayer diffusion area-selectively during sample annealing. Magnetic contrast is observed to be established between the Pd/Fe/Gr/CoPd and Pd/Fe/CoPd areas, leading to a magnetic structure that matches the pattern of the lithographed Gr. These observations demonstrate that Gr patterning is a simple and powerful method for magnetic patterning, which can be applied in the fabrication of future data-storage and spintronic devices.

Original languageEnglish
Article number455301
JournalNanotechnology
Volume30
Issue number45
DOIs
Publication statusPublished - 2019 Aug 21

Fingerprint

Graphite
Graphene
Oxidation
Metallic films
Magnetoelectronics
Magnetic domains
Plasma etching
Electron beam lithography
Information Storage and Retrieval
Magnetic structure
Experiments
Electrons
Annealing
Oxygen
Data storage equipment
Fabrication
Thin films
Equipment and Supplies
Substrates

Keywords

  • grapheme
  • interface
  • magnetism
  • patterning
  • surface

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

Cite this

Magnetic patterning through graphene protection against oxidation and interlayer diffusion. / Liu, Chak Ming; Wang, Wei Hsiang; Jiang, Pei Hsun; Lin, Wen Chin.

In: Nanotechnology, Vol. 30, No. 45, 455301, 21.08.2019.

Research output: Contribution to journalArticle

Liu, Chak Ming ; Wang, Wei Hsiang ; Jiang, Pei Hsun ; Lin, Wen Chin. / Magnetic patterning through graphene protection against oxidation and interlayer diffusion. In: Nanotechnology. 2019 ; Vol. 30, No. 45.
@article{6e298c26ac47474c9254263076b73c82,
title = "Magnetic patterning through graphene protection against oxidation and interlayer diffusion",
abstract = "Graphene (Gr) has been demonstrated to protect metallic thin films against oxidation. Based on this idea, we propose a new method to fabricate microstructured magnetic domains using patterned single-layer Gr. In the first experiment, single-layer Gr was transferred onto a CoPd alloy film pregrown on a SiO2/Si(001) substrate. Subsequently, the single-layer Gr was patterned through electron beam lithography followed by oxygen plasma etching to expose selective micron-sized areas of CoPd. The exposed areas of CoPd were more easily oxidized compared to the areas protected by Gr, which is found to result in significant magnetic contrast between the protected and surface-oxidized areas of CoPd. In the second experiment, a lithographically-patterned Gr layer was placed between the Fe and CoPd layers to block interlayer diffusion area-selectively during sample annealing. Magnetic contrast is observed to be established between the Pd/Fe/Gr/CoPd and Pd/Fe/CoPd areas, leading to a magnetic structure that matches the pattern of the lithographed Gr. These observations demonstrate that Gr patterning is a simple and powerful method for magnetic patterning, which can be applied in the fabrication of future data-storage and spintronic devices.",
keywords = "grapheme, interface, magnetism, patterning, surface",
author = "Liu, {Chak Ming} and Wang, {Wei Hsiang} and Jiang, {Pei Hsun} and Lin, {Wen Chin}",
year = "2019",
month = "8",
day = "21",
doi = "10.1088/1361-6528/ab375e",
language = "English",
volume = "30",
journal = "Nanotechnology",
issn = "0957-4484",
publisher = "IOP Publishing Ltd.",
number = "45",

}

TY - JOUR

T1 - Magnetic patterning through graphene protection against oxidation and interlayer diffusion

AU - Liu, Chak Ming

AU - Wang, Wei Hsiang

AU - Jiang, Pei Hsun

AU - Lin, Wen Chin

PY - 2019/8/21

Y1 - 2019/8/21

N2 - Graphene (Gr) has been demonstrated to protect metallic thin films against oxidation. Based on this idea, we propose a new method to fabricate microstructured magnetic domains using patterned single-layer Gr. In the first experiment, single-layer Gr was transferred onto a CoPd alloy film pregrown on a SiO2/Si(001) substrate. Subsequently, the single-layer Gr was patterned through electron beam lithography followed by oxygen plasma etching to expose selective micron-sized areas of CoPd. The exposed areas of CoPd were more easily oxidized compared to the areas protected by Gr, which is found to result in significant magnetic contrast between the protected and surface-oxidized areas of CoPd. In the second experiment, a lithographically-patterned Gr layer was placed between the Fe and CoPd layers to block interlayer diffusion area-selectively during sample annealing. Magnetic contrast is observed to be established between the Pd/Fe/Gr/CoPd and Pd/Fe/CoPd areas, leading to a magnetic structure that matches the pattern of the lithographed Gr. These observations demonstrate that Gr patterning is a simple and powerful method for magnetic patterning, which can be applied in the fabrication of future data-storage and spintronic devices.

AB - Graphene (Gr) has been demonstrated to protect metallic thin films against oxidation. Based on this idea, we propose a new method to fabricate microstructured magnetic domains using patterned single-layer Gr. In the first experiment, single-layer Gr was transferred onto a CoPd alloy film pregrown on a SiO2/Si(001) substrate. Subsequently, the single-layer Gr was patterned through electron beam lithography followed by oxygen plasma etching to expose selective micron-sized areas of CoPd. The exposed areas of CoPd were more easily oxidized compared to the areas protected by Gr, which is found to result in significant magnetic contrast between the protected and surface-oxidized areas of CoPd. In the second experiment, a lithographically-patterned Gr layer was placed between the Fe and CoPd layers to block interlayer diffusion area-selectively during sample annealing. Magnetic contrast is observed to be established between the Pd/Fe/Gr/CoPd and Pd/Fe/CoPd areas, leading to a magnetic structure that matches the pattern of the lithographed Gr. These observations demonstrate that Gr patterning is a simple and powerful method for magnetic patterning, which can be applied in the fabrication of future data-storage and spintronic devices.

KW - grapheme

KW - interface

KW - magnetism

KW - patterning

KW - surface

UR - http://www.scopus.com/inward/record.url?scp=85071714471&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85071714471&partnerID=8YFLogxK

U2 - 10.1088/1361-6528/ab375e

DO - 10.1088/1361-6528/ab375e

M3 - Article

C2 - 31365913

AN - SCOPUS:85071714471

VL - 30

JO - Nanotechnology

JF - Nanotechnology

SN - 0957-4484

IS - 45

M1 - 455301

ER -