Low-pressure organometallic chemical vapor deposition of indium nitride on titanium dioxide nanoparticles

Jeng Han Wang, M. C. Lin*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

20 Citations (Scopus)

Abstract

Saving for a sunny day: The first thin-film deposition and UV/Vis absorption spectrum of InN-coated TiO2 nanoparticle films is reported. A broad absorption band, which appears in the ≈390-800 nm range (see spectrum) indicates an attractive possibility for solar energy-conversion applications.

Original languageEnglish
Pages (from-to)1615-1618
Number of pages4
JournalChemPhysChem
Volume5
Issue number10
DOIs
Publication statusPublished - 2004 Oct 18
Externally publishedYes

Keywords

  • Indium nitride
  • Photochemistry
  • Sol-gel processes
  • Titanium dioxide
  • Visible absorption

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Physical and Theoretical Chemistry

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