Laser interference lithography and nano-imprint techniques for lower reflection transparent conducting oxide hybrid films

Ta Hsin Chou; Kuei Yuan Cheng; Chih Chieh Su; Tien Li Chang; Chih Wei Hsieh; Jen Hui Tsai

doi:10.1007/s12541-010-0072-6

Laser interference lithography and nano-imprint techniques for lower reflection transparent conducting oxide hybrid films

Ta Hsin Chou^*, Kuei Yuan Cheng, Chih Chieh Su, Tien Li Chang, Chih Wei Hsieh, Jen Hui Tsai

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

The transparent conducting oxide (TCO) film is a significant component in flat panel display industry, applied for flexible display, e-paper, and touch panel. The TCO materials have high refractive index, so the phenomenon of high reflectance is the major issue and needs solved in present and future market. In this study, the structure and process of new lower reflection TCO hybrid film is introduced. The laser interference lithography and UV nanoimprint are combined for fabrication of sub-wavelength structures on PET film, then the tin-doped indium oxide (ITO) deposited on structures. Finally, the best result of this hybrid film is reflectance reduced to 3.3% at wavelength 550nm, just 13% of the original film, and the resistance of ITO layer is 1.05x10^-3 Ω-cm. This result is useful for the TCO film applied in low reflection demand products in the future.

Original language	English
Pages (from-to)	619-622
Number of pages	4
Journal	International Journal of Precision Engineering and Manufacturing
Volume	11
Issue number	4
DOIs	https://doi.org/10.1007/s12541-010-0072-6
Publication status	Published - 2010 Aug
Externally published	Yes

Keywords

Laser interference lithography
Low reflection
Nanoimprint
Transparent conducting oxide

ASJC Scopus subject areas

Mechanical Engineering
Industrial and Manufacturing Engineering
Electrical and Electronic Engineering

Access to Document

10.1007/s12541-010-0072-6

Cite this

@article{bf8cb867f0f14958abc9ef5dae462d70,

title = "Laser interference lithography and nano-imprint techniques for lower reflection transparent conducting oxide hybrid films",

abstract = "The transparent conducting oxide (TCO) film is a significant component in flat panel display industry, applied for flexible display, e-paper, and touch panel. The TCO materials have high refractive index, so the phenomenon of high reflectance is the major issue and needs solved in present and future market. In this study, the structure and process of new lower reflection TCO hybrid film is introduced. The laser interference lithography and UV nanoimprint are combined for fabrication of sub-wavelength structures on PET film, then the tin-doped indium oxide (ITO) deposited on structures. Finally, the best result of this hybrid film is reflectance reduced to 3.3% at wavelength 550nm, just 13% of the original film, and the resistance of ITO layer is 1.05x10-3 Ω-cm. This result is useful for the TCO film applied in low reflection demand products in the future.",

keywords = "Laser interference lithography, Low reflection, Nanoimprint, Transparent conducting oxide",

author = "Chou, {Ta Hsin} and Cheng, {Kuei Yuan} and Su, {Chih Chieh} and Chang, {Tien Li} and Hsieh, {Chih Wei} and Tsai, {Jen Hui}",

year = "2010",

month = aug,

doi = "10.1007/s12541-010-0072-6",

language = "English",

volume = "11",

pages = "619--622",

journal = "International Journal of Precision Engineering and Manufacturing",

issn = "1229-8557",

publisher = "Korean Society of Precision Engineering",

number = "4",

}

TY - JOUR

T1 - Laser interference lithography and nano-imprint techniques for lower reflection transparent conducting oxide hybrid films

AU - Chou, Ta Hsin

AU - Cheng, Kuei Yuan

AU - Su, Chih Chieh

AU - Chang, Tien Li

AU - Hsieh, Chih Wei

AU - Tsai, Jen Hui

PY - 2010/8

Y1 - 2010/8

N2 - The transparent conducting oxide (TCO) film is a significant component in flat panel display industry, applied for flexible display, e-paper, and touch panel. The TCO materials have high refractive index, so the phenomenon of high reflectance is the major issue and needs solved in present and future market. In this study, the structure and process of new lower reflection TCO hybrid film is introduced. The laser interference lithography and UV nanoimprint are combined for fabrication of sub-wavelength structures on PET film, then the tin-doped indium oxide (ITO) deposited on structures. Finally, the best result of this hybrid film is reflectance reduced to 3.3% at wavelength 550nm, just 13% of the original film, and the resistance of ITO layer is 1.05x10-3 Ω-cm. This result is useful for the TCO film applied in low reflection demand products in the future.

AB - The transparent conducting oxide (TCO) film is a significant component in flat panel display industry, applied for flexible display, e-paper, and touch panel. The TCO materials have high refractive index, so the phenomenon of high reflectance is the major issue and needs solved in present and future market. In this study, the structure and process of new lower reflection TCO hybrid film is introduced. The laser interference lithography and UV nanoimprint are combined for fabrication of sub-wavelength structures on PET film, then the tin-doped indium oxide (ITO) deposited on structures. Finally, the best result of this hybrid film is reflectance reduced to 3.3% at wavelength 550nm, just 13% of the original film, and the resistance of ITO layer is 1.05x10-3 Ω-cm. This result is useful for the TCO film applied in low reflection demand products in the future.

KW - Laser interference lithography

KW - Low reflection

KW - Nanoimprint

KW - Transparent conducting oxide

UR - http://www.scopus.com/inward/record.url?scp=78049266390&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=78049266390&partnerID=8YFLogxK

U2 - 10.1007/s12541-010-0072-6

DO - 10.1007/s12541-010-0072-6

M3 - Article

AN - SCOPUS:78049266390

SN - 1229-8557

VL - 11

SP - 619

EP - 622

JO - International Journal of Precision Engineering and Manufacturing

JF - International Journal of Precision Engineering and Manufacturing

IS - 4

ER -

Laser interference lithography and nano-imprint techniques for lower reflection transparent conducting oxide hybrid films

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this