Laser interference lithography and nano-imprint techniques for lower reflection transparent conducting oxide hybrid films

Ta Hsin Chou, Kuei Yuan Cheng, Chih Chieh Su, Tien Li Chang, Chih Wei Hsieh, Jen Hui Tsai

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

The transparent conducting oxide (TCO) film is a significant component in flat panel display industry, applied for flexible display, e-paper, and touch panel. The TCO materials have high refractive index, so the phenomenon of high reflectance is the major issue and needs solved in present and future market. In this study, the structure and process of new lower reflection TCO hybrid film is introduced. The laser interference lithography and UV nanoimprint are combined for fabrication of sub-wavelength structures on PET film, then the tin-doped indium oxide (ITO) deposited on structures. Finally, the best result of this hybrid film is reflectance reduced to 3.3% at wavelength 550nm, just 13% of the original film, and the resistance of ITO layer is 1.05x10-3 Ω-cm. This result is useful for the TCO film applied in low reflection demand products in the future.

Original languageEnglish
Pages (from-to)619-622
Number of pages4
JournalInternational Journal of Precision Engineering and Manufacturing
Volume11
Issue number4
DOIs
Publication statusPublished - 2010 Aug 1
Externally publishedYes

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Keywords

  • Laser interference lithography
  • Low reflection
  • Nanoimprint
  • Transparent conducting oxide

ASJC Scopus subject areas

  • Mechanical Engineering
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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