Investigation of gate-stress engineering in negative capacitance FETs using ferroelectric hafnium aluminum oxides

Chun Hu Cheng*, Chia Chi Fan, Chien Liu, Hsiao Hsuan Hsu, Hsuan Han Chen, Chih Chieh Hsu, Shih An Wang, Chun Yen Chang

*Corresponding author for this work

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Engineering & Materials Science

Chemical Compounds