Investigate the characteristics of 0.65(K0.5Bi0.5TiO3)-0.35BaTiO3 films at various deposition temperatures

W. C. Tzou, Chin-Guo Kuo, P. S. Cheng, Y. H. Lin, C. F. Yang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

0.65(K0.5Bi0.5)TiO3-0.35BaTiO3 (KBT-BT3) ceramics were synthesized using a two-step calcination process that combined hydrothermal and conventional calcination processes. After sintered into ceramic target, KBT-BT3 films were deposited on Pt/Ti/Si and SiO2/Si/Al substrates by radio frequency magnetron (RF) sputtering at various temperatures. The surface morphologies and thicknesses of KBT-BT3 films were characterized by field emission scanning electron microscopy, and the thickness increased with increasing deposition temperature. XRD patterns showed that all KBT-BT3 films were amorphous and higher deposition temperature had no apparent effects to improve the crystalline orientation. The effects of deposition temperatures on the properties of the current-electric filed, polarization-applied electric field, and capacitance- voltage curves were also investigated. As deposition temperatures of KBT-BT3 films increased from room temperature to 400°C, the leakage current density had no apparent variation but the threshold voltage was shifted to lower value. The theorems for the effects of deposition temperature on the properties of KBT-BT3 films were also investigated.

Original languageEnglish
Title of host publicationMetallurgy Technology and Materials II
Pages372-376
Number of pages5
DOIs
Publication statusPublished - 2013 Nov 6
Event2nd International Conference on Metallurgy Technology and Materials, ICMTM 2013 - Hong Kong, China
Duration: 2013 Jun 252013 Jun 26

Publication series

NameAdvanced Materials Research
Volume813
ISSN (Print)1022-6680

Other

Other2nd International Conference on Metallurgy Technology and Materials, ICMTM 2013
CountryChina
CityHong Kong
Period13/6/2513/6/26

Fingerprint

Temperature
Calcination
Electric currents
Amorphous films
Threshold voltage
Leakage currents
Crystal orientation
Field emission
Magnetron sputtering
Surface morphology
Current density
Capacitance
Electric fields
Polarization
Crystalline materials
Scanning electron microscopy
Electric potential
Substrates

Keywords

  • 0.65(KBiTiO)-0.35BaTiO
  • C-V curve
  • I-V curve
  • P-E curve

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Tzou, W. C., Kuo, C-G., Cheng, P. S., Lin, Y. H., & Yang, C. F. (2013). Investigate the characteristics of 0.65(K0.5Bi0.5TiO3)-0.35BaTiO3 films at various deposition temperatures. In Metallurgy Technology and Materials II (pp. 372-376). (Advanced Materials Research; Vol. 813). https://doi.org/10.4028/www.scientific.net/AMR.813.372

Investigate the characteristics of 0.65(K0.5Bi0.5TiO3)-0.35BaTiO3 films at various deposition temperatures. / Tzou, W. C.; Kuo, Chin-Guo; Cheng, P. S.; Lin, Y. H.; Yang, C. F.

Metallurgy Technology and Materials II. 2013. p. 372-376 (Advanced Materials Research; Vol. 813).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Tzou, WC, Kuo, C-G, Cheng, PS, Lin, YH & Yang, CF 2013, Investigate the characteristics of 0.65(K0.5Bi0.5TiO3)-0.35BaTiO3 films at various deposition temperatures. in Metallurgy Technology and Materials II. Advanced Materials Research, vol. 813, pp. 372-376, 2nd International Conference on Metallurgy Technology and Materials, ICMTM 2013, Hong Kong, China, 13/6/25. https://doi.org/10.4028/www.scientific.net/AMR.813.372
Tzou WC, Kuo C-G, Cheng PS, Lin YH, Yang CF. Investigate the characteristics of 0.65(K0.5Bi0.5TiO3)-0.35BaTiO3 films at various deposition temperatures. In Metallurgy Technology and Materials II. 2013. p. 372-376. (Advanced Materials Research). https://doi.org/10.4028/www.scientific.net/AMR.813.372
Tzou, W. C. ; Kuo, Chin-Guo ; Cheng, P. S. ; Lin, Y. H. ; Yang, C. F. / Investigate the characteristics of 0.65(K0.5Bi0.5TiO3)-0.35BaTiO3 films at various deposition temperatures. Metallurgy Technology and Materials II. 2013. pp. 372-376 (Advanced Materials Research).
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