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Influence of Y2O3Doped HfO2High-k Films on Electrical Properties of MOS and MIM Devices

  • Chih Feng Yen
  • , Yu Ya Huang
  • , Shen Hao Tsao
  • , Shih Hao Lin*
  • , Chun Hu Cheng
    • *Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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