INIS
films
100%
oxygen
100%
flow rate
100%
titanium oxides
100%
photocatalysis
100%
sputtering
100%
decomposition
50%
thin films
50%
methylene blue
50%
substrates
33%
illumination
33%
partial pressure
33%
water
16%
surfaces
16%
shape
16%
deposition
16%
morphology
16%
solutions
16%
glass
16%
gases
16%
irradiation
16%
ultraviolet radiation
16%
crystal structure
16%
mhz range
16%
ceramics
16%
xrd
16%
Chemistry
Dioxygen
100%
Liquid Film
100%
Flow Kinetics
100%
Magnetron Sputtering
100%
Titanium Oxide
100%
Photocatalytic
100%
Decomposition
60%
Illumination
40%
Titanium Dioxide
40%
Partial Pressure
40%
Hydrophilicity
40%
Surface
20%
Aqueous Solution
20%
Wetting
20%
Reaction Temperature
20%
Pressure
20%
Crystal Structure
20%
Gas
20%
Glass Substrate
20%
Shape
20%
Ultraviolet Irradiation
20%
Amorphous Structure
20%
X-Ray Diffraction
20%
Alkali
20%
Material Science
Magnetron Sputtering
100%
Thin Films
60%
Temperature
20%
Gas
20%
Contact Angle
20%
Irradiation
20%
Crystal Structure
20%
Ceramics
20%
Glass
20%
Amorphous Material
20%
Surface Morphology
20%
Titanium Dioxide
20%