Influence of oxygen flow rate on photocatalytic TiO 2 films deposited by rf magnetron sputtering

A. H. Chiou, Chin-Guo Kuo, C. H. Huang, W. F. Wu, C. P. Chou, C. Y. Hsu

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Titanium dioxide (TiO 2) thin films having anatase (1 0 1) crystal structure were prepared on non-alkali glass substrates by rf (13.56 MHz) magnetron sputtering using a TiO 2 ceramic target under various oxygen partial pressures. At a fixed substrate temperature of 400 °C and total gas pressure of 1 Pa after 3 h deposition. Effects of oxygen partial pressure on the structural, surface morphology, and photocatalytic activities of the TiO 2 thin films were investigated. We performed both photoinduced decomposition of methylene blue (MB) and photoinduced hydrophilicity under UV light illumination. The XRD patterns exhibited a broad-hump shape indicating the amorphous structure of TiO 2 thin films. The results showed that when the [O 2/(Ar + O 2)] flow rate increased to 50%, the photoinduced decomposition of MB and photoinduced hydrophilicity were enhanced. The water contact angle after 9 min UV illumination was approximately 4.5°, and the methylene blue (MB) solution decomposition from 12 down to 3.34 μ mol/L for 240 min UV irradiation.

Original languageEnglish
Pages (from-to)589-594
Number of pages6
JournalJournal of Materials Science: Materials in Electronics
Volume23
Issue number2
DOIs
Publication statusPublished - 2012 Feb 1

Fingerprint

Methylene Blue
methylene blue
Magnetron sputtering
magnetron sputtering
flow velocity
Flow rate
Hydrophilicity
Oxygen
Decomposition
decomposition
Thin films
Partial pressure
Titanium dioxide
partial pressure
oxygen
thin films
Lighting
illumination
Substrates
titanium oxides

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this

Influence of oxygen flow rate on photocatalytic TiO 2 films deposited by rf magnetron sputtering. / Chiou, A. H.; Kuo, Chin-Guo; Huang, C. H.; Wu, W. F.; Chou, C. P.; Hsu, C. Y.

In: Journal of Materials Science: Materials in Electronics, Vol. 23, No. 2, 01.02.2012, p. 589-594.

Research output: Contribution to journalArticle

Chiou, A. H. ; Kuo, Chin-Guo ; Huang, C. H. ; Wu, W. F. ; Chou, C. P. ; Hsu, C. Y. / Influence of oxygen flow rate on photocatalytic TiO 2 films deposited by rf magnetron sputtering. In: Journal of Materials Science: Materials in Electronics. 2012 ; Vol. 23, No. 2. pp. 589-594.
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