Influence of oxygen flow rate on photocatalytic TiO 2 films deposited by rf magnetron sputtering

A. H. Chiou, C. G. Kuo, C. H. Huang, W. F. Wu, C. P. Chou, C. Y. Hsu

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

Titanium dioxide (TiO 2) thin films having anatase (1 0 1) crystal structure were prepared on non-alkali glass substrates by rf (13.56 MHz) magnetron sputtering using a TiO 2 ceramic target under various oxygen partial pressures. At a fixed substrate temperature of 400 °C and total gas pressure of 1 Pa after 3 h deposition. Effects of oxygen partial pressure on the structural, surface morphology, and photocatalytic activities of the TiO 2 thin films were investigated. We performed both photoinduced decomposition of methylene blue (MB) and photoinduced hydrophilicity under UV light illumination. The XRD patterns exhibited a broad-hump shape indicating the amorphous structure of TiO 2 thin films. The results showed that when the [O 2/(Ar + O 2)] flow rate increased to 50%, the photoinduced decomposition of MB and photoinduced hydrophilicity were enhanced. The water contact angle after 9 min UV illumination was approximately 4.5°, and the methylene blue (MB) solution decomposition from 12 down to 3.34 μ mol/L for 240 min UV irradiation.

Original languageEnglish
Pages (from-to)589-594
Number of pages6
JournalJournal of Materials Science: Materials in Electronics
Volume23
Issue number2
DOIs
Publication statusPublished - 2012 Feb 1

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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