TY - JOUR
T1 - Infinite Berry Curvature of Weyl Fermi Arcs
AU - Wawrzik, Dennis
AU - You, Jhih Shih
AU - Facio, Jorge I.
AU - Van Den Brink, Jeroen
AU - Sodemann, Inti
N1 - Publisher Copyright:
© 2021 American Physical Society.
PY - 2021/7/30
Y1 - 2021/7/30
N2 - We show that Weyl Fermi arcs are generically accompanied by a divergence of the surface Berry curvature scaling as 1/k2, where k is the distance to a hot line in the surface Brillouin zone that connects the projection of Weyl nodes with opposite chirality, but which is distinct from the Fermi arc itself. Such surface Berry curvature appears whenever the bulk Weyl dispersion has a velocity tilt toward the surface of interest. This divergence is reflected in a variety of Berry curvature mediated effects that are readily accessible experimentally and, in particular, leads to a surface Berry curvature dipole that grows linearly with the thickness of a slab of a Weyl semimetal material in the limit of the long lifetime of surface states. This implies the emergence of a gigantic contribution to the nonlinear Hall effect in such devices.
AB - We show that Weyl Fermi arcs are generically accompanied by a divergence of the surface Berry curvature scaling as 1/k2, where k is the distance to a hot line in the surface Brillouin zone that connects the projection of Weyl nodes with opposite chirality, but which is distinct from the Fermi arc itself. Such surface Berry curvature appears whenever the bulk Weyl dispersion has a velocity tilt toward the surface of interest. This divergence is reflected in a variety of Berry curvature mediated effects that are readily accessible experimentally and, in particular, leads to a surface Berry curvature dipole that grows linearly with the thickness of a slab of a Weyl semimetal material in the limit of the long lifetime of surface states. This implies the emergence of a gigantic contribution to the nonlinear Hall effect in such devices.
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U2 - 10.1103/PhysRevLett.127.056601
DO - 10.1103/PhysRevLett.127.056601
M3 - Article
C2 - 34397225
AN - SCOPUS:85112628182
SN - 0031-9007
VL - 127
JO - Physical Review Letters
JF - Physical Review Letters
IS - 5
M1 - 056601
ER -