In situ growth and flux pinning in Ag-doped YBa2Cu3O7-y thin films

H. C. Yang, H. H. Sung, L. Lee, H. E. Horng, T. R. Yang

Research output: Contribution to journalArticle

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Abstract

We have grown in situ Ag-doped YBa2Cu3O7-y thin films by high-pressure magnetron sputtering using a stoichiometric target. The sputtering was carried out in a mixture of Ar (70%) and O2 (30%) at a pressure of 200 mTorr, with the substrate temperature kept at about 700°C during sputtering. We made a relatively high-pressure oxygen environment by employing an oxygen jet near the substrates. After deposition one atmosphere of O2 was introduced into the chamber, and the sample was cooled down to room temperature slowly (5°C/min). This method gives highly reproducible superconducting films with Tc (50%) at 8388 K and zero resistance at 7887 K depending on the growth conditions and the substrates used. In magnetic fields there is a narrowing of the resistive transition width for Y-Ba-Cu-O films with Ag impurities. We attribute the narrowing to the enhanced flux pinning due to the Ag impurities.

Original languageEnglish
Pages (from-to)8634-8637
Number of pages4
JournalPhysical Review B
Volume43
Issue number10
DOIs
Publication statusPublished - 1991 Jan 1

Fingerprint

Flux pinning
flux pinning
Thin films
Sputtering
Substrates
thin films
sputtering
Impurities
Oxygen
high pressure oxygen
impurities
Superconducting films
superconducting films
Magnetron sputtering
magnetron sputtering
chambers
Magnetic fields
atmospheres
Temperature
room temperature

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

In situ growth and flux pinning in Ag-doped YBa2Cu3O7-y thin films. / Yang, H. C.; Sung, H. H.; Lee, L.; Horng, H. E.; Yang, T. R.

In: Physical Review B, Vol. 43, No. 10, 01.01.1991, p. 8634-8637.

Research output: Contribution to journalArticle

Yang, H. C. ; Sung, H. H. ; Lee, L. ; Horng, H. E. ; Yang, T. R. / In situ growth and flux pinning in Ag-doped YBa2Cu3O7-y thin films. In: Physical Review B. 1991 ; Vol. 43, No. 10. pp. 8634-8637.
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