Improvement of the performance of TiHfO MIM capacitors by using a dual plasma treatment of the lower electrode
- C. H. Cheng*
- , H. C. Pan
- , C. C. Huang
- , C. P. Chou
- , C. N. Hsiao
- , J. Hu
- , M. Hwang
- , T. Arikado
- , S. P. McAlister
- , Albert Chin
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
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