Improvement of ferroelectric properties in undoped hafnium oxide thin films using thermal atomic layer deposition
- Jun Dao Luo
- , He Xin Zhang
- , Zheng Ying Wang
- , Siang Sheng Gu
- , Yun Tien Yeh
- , Hao Tung Chung
- , Kai Chi Chuang
- , Chan Yu Liao
- , Wei Shuo Li
- , Yi Shao Li
- , Kai Shin Li
- , Min Hung Lee
- , Huang Chung Cheng
Research output: Contribution to journal › Article › peer-review
8
Link opens in a new tab
Citations
(Scopus)