Improvement of capacitance equivalent thickness, leakage current, and interfacial state density based on crystallized high-k dielectrics/nitrided buffer layer gate stacks

Jhih Jie Huang, Li Tien Huang, Meng Chen Tsai, Min Hung Lee, Miin Jang Chena

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    7 Citations (Scopus)

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    Chemical Compounds

    Engineering & Materials Science