Improved stress reliability of analog TiHfO metal-insulator-metal capacitors using high-work-function electrode

Chun Hu Cheng; Kuo Cheng Chiang; Han Chang Pan; Chien Nan Hsiao; Chang Pin Chou; Sean P. Mcalister; Albert Chin

doi:10.1143/JJAP.46.7300

Improved stress reliability of analog TiHfO metal-insulator-metal capacitors using high-work-function electrode

Chun Hu Cheng^*, Kuo Cheng Chiang, Han Chang Pan, Chien Nan Hsiao, Chang Pin Chou, Sean P. Mcalister, Albert Chin

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

16 Citations (Scopus)

Abstract

We have studied the reliability of high-κ (κ ∼ 49) Ti _xHf_1-xO (x ∼ 0.67) metal-insulator-metal (MIM) capacitors after constant voltage stress induction. The use of a high-work-function Ni top electrode improves not only the leakage current, and temperature- and voltage-coefficients of capacitance, but also the long-term capacitance variation after stress induction.

Original language	English
Pages (from-to)	7300-7302
Number of pages	3
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	46
Issue number	11
DOIs	https://doi.org/10.1143/JJAP.46.7300
Publication status	Published - 2007 Nov 6
Externally published	Yes

Keywords

High work function
MIM
Ni
Reliability
TiHfO

ASJC Scopus subject areas

General Engineering
General Physics and Astronomy

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10.1143/JJAP.46.7300

Cite this

Improved stress reliability of analog TiHfO metal-insulator-metal capacitors using high-work-function electrode. / Cheng, Chun Hu; Chiang, Kuo Cheng; Pan, Han Chang et al.
In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 46, No. 11, 06.11.2007, p. 7300-7302.

Research output: Contribution to journal › Article › peer-review

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abstract = "We have studied the reliability of high-κ (κ ∼ 49) Ti xHf1-xO (x ∼ 0.67) metal-insulator-metal (MIM) capacitors after constant voltage stress induction. The use of a high-work-function Ni top electrode improves not only the leakage current, and temperature- and voltage-coefficients of capacitance, but also the long-term capacitance variation after stress induction.",

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AU - Pan, Han Chang

AU - Hsiao, Chien Nan

AU - Chou, Chang Pin

AU - Mcalister, Sean P.

AU - Chin, Albert

PY - 2007/11/6

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N2 - We have studied the reliability of high-κ (κ ∼ 49) Ti xHf1-xO (x ∼ 0.67) metal-insulator-metal (MIM) capacitors after constant voltage stress induction. The use of a high-work-function Ni top electrode improves not only the leakage current, and temperature- and voltage-coefficients of capacitance, but also the long-term capacitance variation after stress induction.

AB - We have studied the reliability of high-κ (κ ∼ 49) Ti xHf1-xO (x ∼ 0.67) metal-insulator-metal (MIM) capacitors after constant voltage stress induction. The use of a high-work-function Ni top electrode improves not only the leakage current, and temperature- and voltage-coefficients of capacitance, but also the long-term capacitance variation after stress induction.

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Improved stress reliability of analog TiHfO metal-insulator-metal capacitors using high-work-function electrode

Abstract

Keywords

ASJC Scopus subject areas

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