Improved stress reliability of analog TiHfO metal-insulator-metal capacitors using high-work-function electrode

Chun Hu Cheng, Kuo Cheng Chiang, Han Chang Pan, Chien Nan Hsiao, Chang Pin Chou, Sean P. Mcalister, Albert Chin

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

We have studied the reliability of high-κ (κ ∼ 49) Ti xHf1-xO (x ∼ 0.67) metal-insulator-metal (MIM) capacitors after constant voltage stress induction. The use of a high-work-function Ni top electrode improves not only the leakage current, and temperature- and voltage-coefficients of capacitance, but also the long-term capacitance variation after stress induction.

Original languageEnglish
Pages (from-to)7300-7302
Number of pages3
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume46
Issue number11
DOIs
Publication statusPublished - 2007 Nov 6
Externally publishedYes

Fingerprint

capacitors
induction
Capacitors
Capacitance
capacitance
insulators
analogs
Electrodes
electrodes
Electric potential
electric potential
Metals
Leakage currents
metals
leakage
coefficients
Temperature
temperature

Keywords

  • High work function
  • MIM
  • Ni
  • Reliability
  • TiHfO

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Improved stress reliability of analog TiHfO metal-insulator-metal capacitors using high-work-function electrode. / Cheng, Chun Hu; Chiang, Kuo Cheng; Pan, Han Chang; Hsiao, Chien Nan; Chou, Chang Pin; Mcalister, Sean P.; Chin, Albert.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 46, No. 11, 06.11.2007, p. 7300-7302.

Research output: Contribution to journalArticle

Cheng, Chun Hu ; Chiang, Kuo Cheng ; Pan, Han Chang ; Hsiao, Chien Nan ; Chou, Chang Pin ; Mcalister, Sean P. ; Chin, Albert. / Improved stress reliability of analog TiHfO metal-insulator-metal capacitors using high-work-function electrode. In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers. 2007 ; Vol. 46, No. 11. pp. 7300-7302.
@article{de9aec389e7e463ba2a1adb8fc87eb05,
title = "Improved stress reliability of analog TiHfO metal-insulator-metal capacitors using high-work-function electrode",
abstract = "We have studied the reliability of high-κ (κ ∼ 49) Ti xHf1-xO (x ∼ 0.67) metal-insulator-metal (MIM) capacitors after constant voltage stress induction. The use of a high-work-function Ni top electrode improves not only the leakage current, and temperature- and voltage-coefficients of capacitance, but also the long-term capacitance variation after stress induction.",
keywords = "High work function, MIM, Ni, Reliability, TiHfO",
author = "Cheng, {Chun Hu} and Chiang, {Kuo Cheng} and Pan, {Han Chang} and Hsiao, {Chien Nan} and Chou, {Chang Pin} and Mcalister, {Sean P.} and Albert Chin",
year = "2007",
month = "11",
day = "6",
doi = "10.1143/JJAP.46.7300",
language = "English",
volume = "46",
pages = "7300--7302",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
issn = "0021-4922",
publisher = "Japan Society of Applied Physics",
number = "11",

}

TY - JOUR

T1 - Improved stress reliability of analog TiHfO metal-insulator-metal capacitors using high-work-function electrode

AU - Cheng, Chun Hu

AU - Chiang, Kuo Cheng

AU - Pan, Han Chang

AU - Hsiao, Chien Nan

AU - Chou, Chang Pin

AU - Mcalister, Sean P.

AU - Chin, Albert

PY - 2007/11/6

Y1 - 2007/11/6

N2 - We have studied the reliability of high-κ (κ ∼ 49) Ti xHf1-xO (x ∼ 0.67) metal-insulator-metal (MIM) capacitors after constant voltage stress induction. The use of a high-work-function Ni top electrode improves not only the leakage current, and temperature- and voltage-coefficients of capacitance, but also the long-term capacitance variation after stress induction.

AB - We have studied the reliability of high-κ (κ ∼ 49) Ti xHf1-xO (x ∼ 0.67) metal-insulator-metal (MIM) capacitors after constant voltage stress induction. The use of a high-work-function Ni top electrode improves not only the leakage current, and temperature- and voltage-coefficients of capacitance, but also the long-term capacitance variation after stress induction.

KW - High work function

KW - MIM

KW - Ni

KW - Reliability

KW - TiHfO

UR - http://www.scopus.com/inward/record.url?scp=36049005249&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=36049005249&partnerID=8YFLogxK

U2 - 10.1143/JJAP.46.7300

DO - 10.1143/JJAP.46.7300

M3 - Article

AN - SCOPUS:36049005249

VL - 46

SP - 7300

EP - 7302

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 11

ER -