Hybrid-polymer nanostructures forming an anti-reflection film using two-beam interference and ultraviolet nanoimprint lithography

Tien Li Chang; Kuei Yuan Cheng; Ta Hsin Chou; Chih Chieh Su; Han Ping Yang; Shao Wei Luo

doi:10.1016/j.mee.2009.01.038

Hybrid-polymer nanostructures forming an anti-reflection film using two-beam interference and ultraviolet nanoimprint lithography

Tien Li Chang^*, Kuei Yuan Cheng, Ta Hsin Chou, Chih Chieh Su, Han Ping Yang, Shao Wei Luo

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

30 Citations (Scopus)

Abstract

This study presents a new process to fabricate the two-dimensional periodic nanostructures with the specific material of inorganic-organic hybrid polymers (ORMOCER). In this study, the photoresist (PR) originated nanostructures can be fabricated with a two-beam interference method by use of 351 nm-wavelength Argon ion laser light. The replicated mold is performed by Ni electroless plating that Ni mold can be used by ultraviolet nanoimprint lithography (UV-NIL) process imprinting into the hybrid-polymer surface. The hybrid-polymer material is coating on the flexible polyethylene terephthalate (PET). Here, a self-assembled monolayer of fluoroalkyl silane (FAS-SAM) can be effective by means of atmospheric-pressure plasma (AP) chemical vapor modification of Ni mold surface for the duplicated ORMOCER/PET nanostructure film in UV-NIL process. Crown

Original language	English
Pages (from-to)	874-877
Number of pages	4
Journal	Microelectronic Engineering
Volume	86
Issue number	4-6
DOIs	https://doi.org/10.1016/j.mee.2009.01.038
Publication status	Published - 2009 Apr
Externally published	Yes

Keywords

Anti-adhesive layer
Atmospheric-pressure plasma treatment
Hybrid polymers
Nanoimprint
Nanostructures
Two-beam interference

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Surfaces, Coatings and Films
Electrical and Electronic Engineering

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10.1016/j.mee.2009.01.038

Cite this

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title = "Hybrid-polymer nanostructures forming an anti-reflection film using two-beam interference and ultraviolet nanoimprint lithography",

abstract = "This study presents a new process to fabricate the two-dimensional periodic nanostructures with the specific material of inorganic-organic hybrid polymers (ORMOCER). In this study, the photoresist (PR) originated nanostructures can be fabricated with a two-beam interference method by use of 351 nm-wavelength Argon ion laser light. The replicated mold is performed by Ni electroless plating that Ni mold can be used by ultraviolet nanoimprint lithography (UV-NIL) process imprinting into the hybrid-polymer surface. The hybrid-polymer material is coating on the flexible polyethylene terephthalate (PET). Here, a self-assembled monolayer of fluoroalkyl silane (FAS-SAM) can be effective by means of atmospheric-pressure plasma (AP) chemical vapor modification of Ni mold surface for the duplicated ORMOCER/PET nanostructure film in UV-NIL process. Crown",

keywords = "Anti-adhesive layer, Atmospheric-pressure plasma treatment, Hybrid polymers, Nanoimprint, Nanostructures, Two-beam interference",

author = "Chang, {Tien Li} and Cheng, {Kuei Yuan} and Chou, {Ta Hsin} and Su, {Chih Chieh} and Yang, {Han Ping} and Luo, {Shao Wei}",

year = "2009",

month = apr,

doi = "10.1016/j.mee.2009.01.038",

language = "English",

volume = "86",

pages = "874--877",

journal = "Microelectronic Engineering",

issn = "0167-9317",

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AU - Chang, Tien Li

AU - Cheng, Kuei Yuan

AU - Chou, Ta Hsin

AU - Su, Chih Chieh

AU - Yang, Han Ping

AU - Luo, Shao Wei

PY - 2009/4

Y1 - 2009/4

N2 - This study presents a new process to fabricate the two-dimensional periodic nanostructures with the specific material of inorganic-organic hybrid polymers (ORMOCER). In this study, the photoresist (PR) originated nanostructures can be fabricated with a two-beam interference method by use of 351 nm-wavelength Argon ion laser light. The replicated mold is performed by Ni electroless plating that Ni mold can be used by ultraviolet nanoimprint lithography (UV-NIL) process imprinting into the hybrid-polymer surface. The hybrid-polymer material is coating on the flexible polyethylene terephthalate (PET). Here, a self-assembled monolayer of fluoroalkyl silane (FAS-SAM) can be effective by means of atmospheric-pressure plasma (AP) chemical vapor modification of Ni mold surface for the duplicated ORMOCER/PET nanostructure film in UV-NIL process. Crown

AB - This study presents a new process to fabricate the two-dimensional periodic nanostructures with the specific material of inorganic-organic hybrid polymers (ORMOCER). In this study, the photoresist (PR) originated nanostructures can be fabricated with a two-beam interference method by use of 351 nm-wavelength Argon ion laser light. The replicated mold is performed by Ni electroless plating that Ni mold can be used by ultraviolet nanoimprint lithography (UV-NIL) process imprinting into the hybrid-polymer surface. The hybrid-polymer material is coating on the flexible polyethylene terephthalate (PET). Here, a self-assembled monolayer of fluoroalkyl silane (FAS-SAM) can be effective by means of atmospheric-pressure plasma (AP) chemical vapor modification of Ni mold surface for the duplicated ORMOCER/PET nanostructure film in UV-NIL process. Crown

KW - Anti-adhesive layer

KW - Atmospheric-pressure plasma treatment

KW - Hybrid polymers

KW - Nanoimprint

KW - Nanostructures

KW - Two-beam interference

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SP - 874

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JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 4-6

ER -

Hybrid-polymer nanostructures forming an anti-reflection film using two-beam interference and ultraviolet nanoimprint lithography

Abstract

Keywords

ASJC Scopus subject areas

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