Hybrid-polymer nanostructures forming an anti-reflection film using two-beam interference and ultraviolet nanoimprint lithography

Tien Li Chang, Kuei Yuan Cheng, Ta Hsin Chou, Chih Chieh Su, Han Ping Yang, Shao Wei Luo

Research output: Contribution to journalArticle

25 Citations (Scopus)


This study presents a new process to fabricate the two-dimensional periodic nanostructures with the specific material of inorganic-organic hybrid polymers (ORMOCER). In this study, the photoresist (PR) originated nanostructures can be fabricated with a two-beam interference method by use of 351 nm-wavelength Argon ion laser light. The replicated mold is performed by Ni electroless plating that Ni mold can be used by ultraviolet nanoimprint lithography (UV-NIL) process imprinting into the hybrid-polymer surface. The hybrid-polymer material is coating on the flexible polyethylene terephthalate (PET). Here, a self-assembled monolayer of fluoroalkyl silane (FAS-SAM) can be effective by means of atmospheric-pressure plasma (AP) chemical vapor modification of Ni mold surface for the duplicated ORMOCER/PET nanostructure film in UV-NIL process. Crown

Original languageEnglish
Pages (from-to)874-877
Number of pages4
JournalMicroelectronic Engineering
Issue number4-6
Publication statusPublished - 2009 Apr 1
Externally publishedYes



  • Anti-adhesive layer
  • Atmospheric-pressure plasma treatment
  • Hybrid polymers
  • Nanoimprint
  • Nanostructures
  • Two-beam interference

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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