Hybrid-polymer nanostructures forming an anti-reflection film using two-beam interference and ultraviolet nanoimprint lithography

Tien Li Chang, Kuei Yuan Cheng, Ta Hsin Chou, Chih Chieh Su, Han Ping Yang, Shao Wei Luo

Research output: Contribution to journalArticle

25 Citations (Scopus)

Abstract

This study presents a new process to fabricate the two-dimensional periodic nanostructures with the specific material of inorganic-organic hybrid polymers (ORMOCER). In this study, the photoresist (PR) originated nanostructures can be fabricated with a two-beam interference method by use of 351 nm-wavelength Argon ion laser light. The replicated mold is performed by Ni electroless plating that Ni mold can be used by ultraviolet nanoimprint lithography (UV-NIL) process imprinting into the hybrid-polymer surface. The hybrid-polymer material is coating on the flexible polyethylene terephthalate (PET). Here, a self-assembled monolayer of fluoroalkyl silane (FAS-SAM) can be effective by means of atmospheric-pressure plasma (AP) chemical vapor modification of Ni mold surface for the duplicated ORMOCER/PET nanostructure film in UV-NIL process. Crown

Original languageEnglish
Pages (from-to)874-877
Number of pages4
JournalMicroelectronic Engineering
Volume86
Issue number4-6
DOIs
Publication statusPublished - 2009 Apr 1

Fingerprint

Nanoimprint lithography
Nanostructures
Polymers
Polyethylene Terephthalates
lithography
polyethylene terephthalate
interference
Polyethylene terephthalates
polymers
Silanes
Argon
Electroless plating
Self assembled monolayers
Photoresists
plating
photoresists
silanes
Atmospheric pressure
atmospheric pressure
Vapors

Keywords

  • Anti-adhesive layer
  • Atmospheric-pressure plasma treatment
  • Hybrid polymers
  • Nanoimprint
  • Nanostructures
  • Two-beam interference

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

Cite this

Hybrid-polymer nanostructures forming an anti-reflection film using two-beam interference and ultraviolet nanoimprint lithography. / Chang, Tien Li; Cheng, Kuei Yuan; Chou, Ta Hsin; Su, Chih Chieh; Yang, Han Ping; Luo, Shao Wei.

In: Microelectronic Engineering, Vol. 86, No. 4-6, 01.04.2009, p. 874-877.

Research output: Contribution to journalArticle

Chang, Tien Li ; Cheng, Kuei Yuan ; Chou, Ta Hsin ; Su, Chih Chieh ; Yang, Han Ping ; Luo, Shao Wei. / Hybrid-polymer nanostructures forming an anti-reflection film using two-beam interference and ultraviolet nanoimprint lithography. In: Microelectronic Engineering. 2009 ; Vol. 86, No. 4-6. pp. 874-877.
@article{6cea97e47c3f4ce395446aa9619b194c,
title = "Hybrid-polymer nanostructures forming an anti-reflection film using two-beam interference and ultraviolet nanoimprint lithography",
abstract = "This study presents a new process to fabricate the two-dimensional periodic nanostructures with the specific material of inorganic-organic hybrid polymers (ORMOCER). In this study, the photoresist (PR) originated nanostructures can be fabricated with a two-beam interference method by use of 351 nm-wavelength Argon ion laser light. The replicated mold is performed by Ni electroless plating that Ni mold can be used by ultraviolet nanoimprint lithography (UV-NIL) process imprinting into the hybrid-polymer surface. The hybrid-polymer material is coating on the flexible polyethylene terephthalate (PET). Here, a self-assembled monolayer of fluoroalkyl silane (FAS-SAM) can be effective by means of atmospheric-pressure plasma (AP) chemical vapor modification of Ni mold surface for the duplicated ORMOCER/PET nanostructure film in UV-NIL process. Crown",
keywords = "Anti-adhesive layer, Atmospheric-pressure plasma treatment, Hybrid polymers, Nanoimprint, Nanostructures, Two-beam interference",
author = "Chang, {Tien Li} and Cheng, {Kuei Yuan} and Chou, {Ta Hsin} and Su, {Chih Chieh} and Yang, {Han Ping} and Luo, {Shao Wei}",
year = "2009",
month = "4",
day = "1",
doi = "10.1016/j.mee.2009.01.038",
language = "English",
volume = "86",
pages = "874--877",
journal = "Microelectronic Engineering",
issn = "0167-9317",
publisher = "Elsevier",
number = "4-6",

}

TY - JOUR

T1 - Hybrid-polymer nanostructures forming an anti-reflection film using two-beam interference and ultraviolet nanoimprint lithography

AU - Chang, Tien Li

AU - Cheng, Kuei Yuan

AU - Chou, Ta Hsin

AU - Su, Chih Chieh

AU - Yang, Han Ping

AU - Luo, Shao Wei

PY - 2009/4/1

Y1 - 2009/4/1

N2 - This study presents a new process to fabricate the two-dimensional periodic nanostructures with the specific material of inorganic-organic hybrid polymers (ORMOCER). In this study, the photoresist (PR) originated nanostructures can be fabricated with a two-beam interference method by use of 351 nm-wavelength Argon ion laser light. The replicated mold is performed by Ni electroless plating that Ni mold can be used by ultraviolet nanoimprint lithography (UV-NIL) process imprinting into the hybrid-polymer surface. The hybrid-polymer material is coating on the flexible polyethylene terephthalate (PET). Here, a self-assembled monolayer of fluoroalkyl silane (FAS-SAM) can be effective by means of atmospheric-pressure plasma (AP) chemical vapor modification of Ni mold surface for the duplicated ORMOCER/PET nanostructure film in UV-NIL process. Crown

AB - This study presents a new process to fabricate the two-dimensional periodic nanostructures with the specific material of inorganic-organic hybrid polymers (ORMOCER). In this study, the photoresist (PR) originated nanostructures can be fabricated with a two-beam interference method by use of 351 nm-wavelength Argon ion laser light. The replicated mold is performed by Ni electroless plating that Ni mold can be used by ultraviolet nanoimprint lithography (UV-NIL) process imprinting into the hybrid-polymer surface. The hybrid-polymer material is coating on the flexible polyethylene terephthalate (PET). Here, a self-assembled monolayer of fluoroalkyl silane (FAS-SAM) can be effective by means of atmospheric-pressure plasma (AP) chemical vapor modification of Ni mold surface for the duplicated ORMOCER/PET nanostructure film in UV-NIL process. Crown

KW - Anti-adhesive layer

KW - Atmospheric-pressure plasma treatment

KW - Hybrid polymers

KW - Nanoimprint

KW - Nanostructures

KW - Two-beam interference

UR - http://www.scopus.com/inward/record.url?scp=67349246269&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=67349246269&partnerID=8YFLogxK

U2 - 10.1016/j.mee.2009.01.038

DO - 10.1016/j.mee.2009.01.038

M3 - Article

AN - SCOPUS:67349246269

VL - 86

SP - 874

EP - 877

JO - Microelectronic Engineering

JF - Microelectronic Engineering

SN - 0167-9317

IS - 4-6

ER -