Highly Reliable and High-Yield 1.2V HfZrOx FRAM and its Physical Origin via Micrometer-Scale Nanocrystalline Domain Analysis

  • Yu De Lin*
  • , Chen Yi Cho
  • , Jian Wei Su
  • , Yi Hui Wei
  • , Li Ying Hung
  • , Po Han Chang
  • , Ching Chih Hsu
  • , Po Chun Yeh
  • , Min Hung Lee
  • , Tuo Hung Hou
  • , Shyh Shyuan Sheu
  • , Wei Chung Lo
  • , Shih Chieh Chang
  • *Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A highly reliable HfZrOx FRAM technology has been achieved with the endurance of up to 1012 cycles at 85°C with ±1.2V. 256 kb 1T1C FRAM chips with 8nm and 6nm HfZrOx exhibit a 100% 8kb-yield without wake-up (84% of chips) and with a 400 μs wake-up pulse at room temperature, respectively. An operation speed of 20ns at ±1.2V is demonstrated in the Shmoo plot. The robust high-temperature reliability and high-yield arrays are achieved through a solid understanding of over-optimistic 2Pr and transmission Kikuchi diffraction (TKD) for micrometer-scale nanocrystalline crystal domain inspection. This work suggests a viable scaling path and improves the performance of HfZrOx FRAM technology.

Original languageEnglish
Title of host publication2024 IEEE International Electron Devices Meeting, IEDM 2024
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9798350365429
DOIs
Publication statusPublished - 2024
Externally publishedYes
Event2024 IEEE International Electron Devices Meeting, IEDM 2024 - San Francisco, United States
Duration: 2024 Dec 72024 Dec 11

Publication series

NameTechnical Digest - International Electron Devices Meeting, IEDM
ISSN (Print)0163-1918

Conference

Conference2024 IEEE International Electron Devices Meeting, IEDM 2024
Country/TerritoryUnited States
CitySan Francisco
Period2024/12/072024/12/11

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Materials Chemistry
  • Electrical and Electronic Engineering

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