High-performance poly-Si TFTs using ultrathin HfSiOx gate dielectric for monolithic three-dimensional integrated circuits and system on glass applications
- M. H. Lee
- , S. L. Wu
- , M. J. Yang
- , K. J. Chen
- , G. L. Luo
- , L. S. Lee
- , M. J. Kao
Research output: Contribution to journal › Article › peer-review
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